Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 14/20 | 0.36 |
| ▸ | CA1 | P00915 | 13/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA4 | P22748 | 1/20 | 0.34 |
| ▸ | CA6 | P23280 | 1/20 | 0.34 |
| ▸ | CA5A | P35218 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.34 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.34 |
| ▸ | MMP1 | P03956 | 2/20 | 0.31 |
| ▸ | MMP2 | P08253 | 2/20 | 0.31 |
| ▸ | MMP9 | P14780 | 2/20 | 0.31 |
| ▸ | MMP8 | P22894 | 2/20 | 0.31 |
| ▸ | MMP13 | P45452 | 2/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5691997 | 0.84 | CA2 (0.33) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL5691705 | 0.83 | CA2 (0.35) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL682975 | 0.78 | TDP1 (0.48) | CA2CA1CA12CA4CA6 | |
| Iodide SCHEMBL546036 | 0.77 | TDP1 (0.47) | CA2CA1CA12CA4CA6 | |
| SCHEMBL3289780 | 0.77 | GPR3 (0.31) | — | |
| Acetic Acid SCHEMBL3775709 | 0.75 | TSHR (0.39) | CA2CA1CA12CA4CA6 | |
| SCHEMBL10167772 | 0.74 | TDP1 (0.44) | CA2CA1CA12CA4CA6 | |
| SCHEMBL5690740 | 0.73 | CA2 (0.35) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL29869290 | 0.72 | — | — | |
| SCHEMBL6708360 | 0.71 | CA2 (0.35) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8084183-B2 | Resist composition for electron beam, X-ray, or EUV, and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-12-27 | — | — | US | disclosed |
| US-8021819-B2 | Sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-09-20 | — | — | US | disclosed |
| EP-1816519-B1 | Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition | FUJIFILM CORP (JP) | 2010-11-03 | — | — | EP | disclosed |
| US-20090047598-A1 | RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY, OR EUV, AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-02-19 | — | — | US | disclosed |
| EP-2020616-A2 | Resist composition for electron beam, x-ray, or euv, and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2009-02-04 | — | — | EP | disclosed |
| US-20070184384-A1 | Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-08-09 | — | — | US | disclosed |
| EP-1816519-A1 | Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition | FUJIFILM Corporation (JP) | 2007-08-08 | — | — | EP | disclosed |