SCHEMBL10167772

SCHEMBL10167772

OCCc1ccc(-c2ccc(-[s+]3c4ccccc4c4ccccc43)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.44
MAPKAPK2 P49137 2/20 0.39
CA2 P00918 2/20 0.38
FFAR1 O14842 1/20 0.36
MMP12 P39900 4/20 0.34
MMP13 P45452 3/20 0.34
HDAC2 Q92769 2/20 0.33
RIPK1 Q13546 1/20 0.33
CNR2 P34972 1/20 0.33
HDAC1 Q13547 1/20 0.33
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA4 P22748 1/20 0.33
CA6 P23280 1/20 0.33
CA5A P35218 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
CA14 Q9ULX7 1/20 0.33
CA5B Q9Y2D0 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682975 0.95 TDP1 (0.48) TDP1MAPKAPK2CA2FFAR1CA12
Iodide SCHEMBL546036 0.93 TDP1 (0.47) TDP1MAPKAPK2CA2FFAR1CA12
Acetic Acid SCHEMBL3775709 0.84 TSHR (0.39) TDP1CA2FFAR1HDAC2HDAC1
SCHEMBL10167783 0.82 CA2 (0.41) TDP1CA2HDAC2HDAC1ALOX5
SCHEMBL2611737 0.82 CA2 (0.41) TDP1CA2HDAC2HDAC1ALOX5
SCHEMBL10167766 0.81 KDM4E (0.42) TDP1MAPKAPK2CA2RIPK1CA12
SCHEMBL3434759 0.80 TSHR (0.44) CA2CA12CA1CA4CA6
SCHEMBL2611741 0.79 LMNA (0.35)
SCHEMBL2611753 0.75 MAPKAPK2 (0.40) TDP1MAPKAPK2CA2KDM4EALDH1A1
SCHEMBL10167792 0.75 CA2 (0.37) TDP1CA2CA12CA1CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8110333-B2 Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound FUJIFILM CORPORATION (JP) 2012-02-07 US disclosed
US-7858289-B2 Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-12-28 US disclosed
US-20090111047-A1 POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-30 US disclosed
US-20090042124-A1 RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND FUJIFILM CORPORATION (JP) 2009-02-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090042124-A1 RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND ADH5, SRRM2, ADH1A TDP1 4667/4885MAPKAPK2 3907/4885CA2 3080/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.