SCHEMBL23907102

SCHEMBL23907102

CCOCOCc1ccc(CO)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.36
TRPV1 Q8NER1 1/20 0.36
TSHR P16473 2/20 0.36
NOS3 P29474 1/20 0.34
NOS1 P29475 1/20 0.34
PPARG P37231 1/20 0.34
PPARA Q07869 1/20 0.34
PRSS1 P07477 1/20 0.33
PRSS2 P07478 1/20 0.33
PRSS3 P35030 1/20 0.33
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
VHL P40337 1/20 0.32
ELOC Q15369 1/20 0.32
ELOB Q15370 1/20 0.32
CA12 O43570 1/20 0.32
CA4 P22748 1/20 0.32
CA6 P23280 1/20 0.32
CA5A P35218 1/20 0.32
CA7 P43166 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2416644 0.89 TSHR (0.40) LTA4HTRPV1TSHRNOS3NOS1
SCHEMBL23906770 0.89 TSHR (0.42) TRPV1TSHRCA1CA2CA9
SCHEMBL8968734 0.85 IDO1 (0.46) LTA4HCA1CA2CA12CA7
Ether SCHEMBL10966547 0.82 TSHR (0.46) LTA4HTSHRNOS3NOS1PPARG
SCHEMBL2408827 0.80 TRPV1 (0.34) LTA4HTRPV1TSHRNOS3NOS1
SCHEMBL6671514 0.79 TSHR (0.52) LTA4HTSHRNOS3NOS1PPARG
SCHEMBL1372413 0.79 IDO1 (0.48) POLBKDM4EALDH1A1IDO1HPGD
SCHEMBL8180214 0.79 LPL (0.53) TRPV1TSHRCA1CA2
Parahydroxybenzyl Alcohol SCHEMBL5838200 0.78 CA2 (0.44) LTA4HCA1CA2CA12CA7
SCHEMBL5353833 0.78 TSHR (0.61) TSHRCA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed