SCHEMBL7873607

SCHEMBL7873607

Cc1cc(I)cc(I)c1O

nearest known ligand 0.78

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 2/20 0.78
ERN1 O75460 1/20 0.48
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
ALB P02768 2/20 0.42
GABRA1 P14867 1/20 0.42
GABRB1 P18505 1/20 0.42
GABRB2 P47870 1/20 0.42
LMNA P02545 3/20 0.39
MEN1 O00255 2/20 0.39
HTT P42858 2/20 0.39
KMT2A Q03164 2/20 0.39
CYP1A2 P05177 2/20 0.39
CYP2C9 P11712 2/20 0.39
HIF1A Q16665 1/20 0.39
HSD17B10 Q99714 1/20 0.39
KDM4E B2RXH2 2/20 0.37
MAPT P10636 2/20 0.37
ALDH1A1 P00352 2/20 0.37
GAA P10253 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL720219 0.88 TTR (0.58) TTRCA1CA2GABRA1GABRB1
Triiodophenol SCHEMBL338137 0.88 TTR (1.00) TTRERN1CA1CA2ALB
SCHEMBL815630 0.78 ALDH1A1 (0.54) TTRERN1CA1CA2ALB
SCHEMBL23907108 0.78 TTR (0.52) TTRCA1CA2ALBLMNA
SCHEMBL21241704 0.76 TTR (0.50) TTRERN1CA1CA2ALB
SCHEMBL16790391 0.76 CA1 (0.74) TTRCA1CA2ALBLMNA
SCHEMBL180127 0.74 TTR (0.48) TTRERN1
SCHEMBL10068236 0.74 TTR (0.48) TTRERN1
SCHEMBL29369981 0.74 TTR (0.48) TTRERN1
SCHEMBL16379755 0.74 TTR (0.48) TTRCA1CA2ALBGABRA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20230355833-A1 RADIOPAQUE POLYMERS BIOCOMPATIBLES UK LIMITED (GB) 2023-11-09 US disclosed
US-20230355833-A1 RADIOPAQUE POLYMERS BIOCOMPATIBLES UK LIMITED (GB) 2023-11-09 US disclosed
US-20230341775-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-26 US disclosed
US-20230279172-A1 RADIOPAQUE POLYMERS Boston Scientific Medical Device Limited (IE) 2023-09-07 US disclosed
US-20230279172-A1 RADIOPAQUE POLYMERS Boston Scientific Medical Device Limited (IE) 2023-09-07 US disclosed
US-11744916-B2 Radiopaque polymers BIOCOMPATIBLES UK LIMITED 2023-09-05 US disclosed
US-11744916-B2 Radiopaque polymers BIOCOMPATIBLES UK LIMITED 2023-09-05 US disclosed
EP-2120095-A1 RESIST LOWER LAYER FILM FORMING COMPOSITION FOR ELECTRON LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2009-11-18 EP disclosed
US-7309560-B2 Composition for forming anti-reflective coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-12-18 US disclosed
US-7309560-B2 Composition for forming anti-reflective coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-12-18 US disclosed
US-20070190459-A1 Resist underlayer coating forming composition for mask blank, mask blank and mask HOYA CORPORATION (JP) 2007-08-16 US disclosed
US-20070190459-A1 Resist underlayer coating forming composition for mask blank, mask blank and mask HOYA CORPORATION (JP) 2007-08-16 US disclosed
EP-0707849-B1 USE OF DERIVATIVES OF 2,4-DISUBSTITUTED PHENOLS AS 5-LIPOXIGENASE INHIBITORS BOBEL246 S L (ES) 2001-12-19 EP disclosed
US-6320016-B1 X-RAY DETECTABLE ARTICLE MOLDED FROM THERMOPLASTIC COMPOSITION; TOY, MEDICAL EQUIPMENT SUCH AS TUBES, JOINT PARTS BAYER AKTIENGESELLSCHAFT (DE) 2001-11-20 US disclosed
US-5643929-A TREATMENT OF PICORNAVIRAL OR RHINOVIRUS AND CHEMICAL INTERMEDIATES SANOFI WINTHROP, INC. (US) 1997-07-01 US disclosed
US-5464848-A 1,2,4-oxadiazolyl-phenoxyalkylisoxazoles and their use as antiviral agents STERLING WINTHROP INC. (US) 1995-11-07 US disclosed
US-3988369-A Process and reactant for halogenating organic compounds PEARSON DONALD E 1976-10-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SCO2, CBR1, OXGR1 TTR 2982/4885ERN1 3374/4885CA1 113/4885
US-20230279172-A1 RADIOPAQUE POLYMERS SSTR3, VHL, PLG TTR 1841/4885ERN1 2648/4885CA1 2647/4885
US-20230355833-A1 RADIOPAQUE POLYMERS TPO, PGLS, IQGAP1 TTR 435/4885ERN1 3496/4885CA1 1911/4885
US-11744916-B2 Radiopaque polymers TPO, PGLS, IQGAP1 TTR 435/4885ERN1 3496/4885CA1 1911/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.