SCHEMBL23909607

SCHEMBL23909607

N#Cc1ccc2cccc(S(=O)(=O)Cl)c2c1

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.50
CA2 P00918 4/20 0.50
TRPV4 Q9HBA0 2/20 0.49
KDM4E B2RXH2 2/20 0.37
ALDH1A1 P00352 2/20 0.37
LMNA P02545 1/20 0.37
MAPT P10636 1/20 0.37
HPGD P15428 1/20 0.37
HTT P42858 1/20 0.37
CNR1 P21554 1/20 0.37
CNR2 P34972 1/20 0.37
RAD51 Q06609 1/20 0.36
CA9 Q16790 1/20 0.36
SLC22A12 Q96S37 3/20 0.36
KAT6A Q92794 1/20 0.36
PTPN1 P18031 1/20 0.35
CYP19A1 P11511 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23909530 0.87 CA1 (0.54) CA1CA2TRPV4CNR1CNR2
SCHEMBL23909576 0.84 CA1 (0.56) CA1CA2KDM4EALDH1A1LMNA
SCHEMBL12212866 0.84 CA1 (0.50) CA1CA2TRPV4KDM4EALDH1A1
SCHEMBL10408524 0.77 CA1 (0.42) CA1CA2TRPV4KDM4EALDH1A1
SCHEMBL27040545 0.76 TRPV4 (0.43) CA1CA2TRPV4KDM4EMAPT
SCHEMBL11136985 0.76 HTR6 (0.41) CA1CA2ALDH1A1LMNACA9
SCHEMBL10408514 0.75 CA1 (0.41) CA1CA2KDM4EALDH1A1MAPT
SCHEMBL19441037 0.75 CYP2A6 (0.53) CA1CA2MAPTCA9
SCHEMBL8493412 0.75 CTDSP1 (0.50) CA1CA2ALDH1A1LMNACA9
SCHEMBL4109390 0.74 CA1 (0.53) CA1CA2KDM4EALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113527680-B Polymer, photosensitive resin composition, pattern forming method, cured film, and electronic component 信越化学工业株式会社 2023-04-28 CN disclosed
EP-3896521-B1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHINETSU CHEMICAL CO (JP) 2022-12-14 EP disclosed
US-11333975-B2 Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2022-05-17 US disclosed
CN-113527680-A Polymer, photosensitive resin composition, pattern forming method, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
EP-3896521-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2021-10-20 EP disclosed
US-20210317268-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-14 US disclosed