SCHEMBL2395911

SCHEMBL2395911

C1[C]2CC3CC1CC(C14C[C]5CC(CC(C5)C1)C4)(C2)C3

nearest known ligand 0.32

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 1/20 0.31
GRIN3B O60391 1/20 0.31
GRIN1 Q05586 1/20 0.31
GRIN2A Q12879 1/20 0.31
GRIN2B Q13224 1/20 0.31
GRIN2C Q14957 1/20 0.31
GRIN3A Q8TCU5 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27829376 0.95 GRIN2D (0.33) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL5670500 0.74
SCHEMBL11246246 0.74
SCHEMBL3293369 0.74 GRIN2D (0.33) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL216451 0.74 PKM (0.37)
SCHEMBL3512411 0.74 GRIN2D (0.50) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL4436229 0.74
SCHEMBL25216482 0.70 GRIN2D (0.58) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL5050690 0.69 GRIN2D (0.44) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL6504064 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110227990-A1 COMPOSITE PARTICLES, METHOD OF MANUFACTURING COMPOSITE PARTICLES, AQUEOUS INK COMPOSITION, AND IMAGE FORMING METHOD USING AQUEOUS INK COMPOSITION FUJIFILM CORPORATION (JP) 2011-09-22 US disclosed
EP-2366723-A2 COMPOSITE PARTICLES, METHOD OF MANUFACTURING COMPOSITE PARTICLES, AQUEOUS INK COMPOSITION, AND IMAGE FORMING METHOD USING AQUEOUS INK COMPOSITION Fujifilm Corporation (JP) 2011-09-21 EP disclosed
US-20100166963-A1 METHOD FOR MANUFACTURING WATER-BASED DISPERSION OF SELF-DISPERSING POLYMER, WATER-BASED INK COMPOSITION, INK SET AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2010-07-01 US disclosed