SCHEMBL2399537

SCHEMBL2399537

CC[n+]1ccn(C)c1.O=C([O-])C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.31
HSP90AA1 P07900 1/20 0.31
KMT2A Q03164 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9060610 0.89 MEN1 (0.45) MEN1HSP90AA1KMT2ASMN1; SMN2
SCHEMBL2400551 0.87 MEN1 (0.36) MEN1HSP90AA1KMT2ASMN1; SMN2
Trifluoroacetic Acid SCHEMBL358901 0.86 FDPS (0.31) MEN1HSP90AA1KMT2ASMN1; SMN2
SCHEMBL6570796 0.83 MEN1 (0.33) MEN1HSP90AA1KMT2ASMN1; SMN2
Pivalate SCHEMBL2523721 0.82 ALDH1A1 (0.36) MEN1HSP90AA1KMT2ASMN1; SMN2
Bicarbonate SCHEMBL2936301 0.81 MEN1 (0.35) MEN1HSP90AA1KMT2ASMN1; SMN2
SCHEMBL6570792 0.81 MEN1 (0.36) MEN1HSP90AA1KMT2ASMN1; SMN2
Bicarbonate SCHEMBL357950 0.80 MEN1 (0.34) MEN1HSP90AA1KMT2ASMN1; SMN2
Acetic Acid SCHEMBL302142 0.80 MEN1 (0.37) MEN1HSP90AA1KMT2ASMN1; SMN2
Bicarbonate SCHEMBL2229450 0.80 MEN1 (0.34) MEN1HSP90AA1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025079719-A1 COPOLYESTER FILM AND HEAT-SHRINKABLE POLYESTER FILM 東洋紡株式会社 2025-04-17 WO disclosed
WO-2025079717-A1 POLYESTER FILM HAVING RESIN THIN FILM LAYER 東洋紡株式会社 2025-04-17 WO disclosed
WO-2025079679-A1 POLYESTER FILM, METHOD FOR PRODUCING SAME, AND RESIN COMPOSITION 東洋紡株式会社 2025-04-17 WO disclosed
WO-2025079681-A1 WHITE POLYESTER FILM 東洋紡株式会社 2025-04-17 WO disclosed
WO-2025079727-A1 LAMINATE HAVING POLYESTER FILM AND FUNCTIONAL LAYER 東洋紡株式会社 2025-04-17 WO disclosed
WO-2025079674-A1 THERMOPLASTIC RESIN COMPOSITION 東洋紡株式会社 2025-04-17 WO disclosed
CN-114716944-B Surface protective film 日东电工株式会社 2025-02-25 CN disclosed
US-20230323171-A1 ADHESIVE COMPOSITION CONTAINING ANTISTATIC AGENT AND SURFACE PROTECTIVE FILM XINMEI FONTANA HOLDING (HONG KONG) LIMITED (CN) 2023-10-12 US disclosed
WO-2023190079-A1 ADHESIVE SHEET FOR OPTICAL APPLICATIONS 日東電工株式会社 2023-10-05 WO disclosed
WO-2023190078-A1 ADHESIVE SHEET FOR OPTICAL APPLICATIONS 日東電工株式会社 2023-10-05 WO disclosed
US-20090053519-A1 Adhestive composition and optical member including the same Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2009-02-26 US disclosed
US-20090029162-A1 PRESSURE SENSITIVE ADHESIVE COMPOSITION, PRESSURE SENSITIVE ADHESIVE SHEET AND SURFACE PROTECTIVE FILM NITTO DENKO CORPORATION (JP) 2009-01-29 US disclosed
EP-1939263-A1 ADHESIVE COMPOSITION, ADHESIVE SHEET, AND SURFACE PROTECTIVE FILM Nitto Denko Corporation (JP) 2008-07-02 EP disclosed
EP-1889889-A2 Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheets and surface protecting film Nitto Denko Corporation (JP) 2008-02-20 EP disclosed
EP-1884547-A1 PRESSURE SENSITIVE ADHESIVE COMPOSITION, PRESSURE SENSITIVE ADHESIVE SHEET AND SURFACE PROTECTIVE FILM Nitto Denko Corporation (JP) 2008-02-06 EP disclosed
EP-1582573-A2 Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheets and surface protecting film Nitto Denko Corporation (JP) 2005-10-05 EP disclosed
CN-1667071-A Adhesive composition, adhesive sheets and surface protective film NITTO DENKO CORP (JP) 2005-09-14 CN disclosed
US-20050197450-A1 Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheets and surface protecting film NITTO DENKO CORPORATION (JP) 2005-09-08 US disclosed
EP-0737358-B1 PHOTOELECTROCHEMICAL CELL AND ELECTROLYTE THEREFOR ECOLE POLYTECH (CH) 1999-02-03 EP disclosed
US-5728487-A Photoelectrochemical cell and electrolyte for this cell ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (CH) 1998-03-17 US disclosed