Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 3/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | USP2 | O75604 | 2/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2400304 | 0.92 | LMNA (0.38) | LMNAPOLBTSHRSMN1; SMN2ALDH1A1 | |
| SCHEMBL15240267 | 0.92 | TSHR (0.44) | LMNAPOLBTSHRSMN1; SMN2ALDH1A1 | |
| SCHEMBL2402957 | 0.84 | SMN1; SMN2 (0.41) | LMNAPOLBTSHRSMN1; SMN2ALDH1A1 | |
| SCHEMBL26928863 | 0.84 | SMN1; SMN2 (0.41) | TSHRSMN1; SMN2ALDH1A1TDP1PDK1 | |
| SCHEMBL10877779 | 0.83 | TSHR (0.61) | LMNATSHRSMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL30018303 | 0.83 | TSHR (0.61) | LMNATSHRSMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL5958589 | 0.83 | TSHR (0.61) | LMNATSHRSMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL27615 | 0.83 | TSHR (0.61) | LMNATSHRSMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL284717 | 0.83 | TSHR (0.61) | LMNATSHRSMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL9776547 | 0.82 | TSHR (0.55) | TSHRSMN1; SMN2ALDH1A1TDP1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230305405-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305405-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230244149-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20230244149-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-11385544-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-12 | — | — | US | disclosed |
| US-20210026246-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-01-28 | — | — | US | disclosed |
| EP-2674457-A1 | RUBBER COMPOSITION AND PNEUMATIC TIRE | Sumitomo Rubber Industries, Ltd. (JP) | 2013-12-18 | — | — | EP | disclosed |
| EP-2671916-A1 | RUBBER COMPOSITION AND PNEUMATIC TIRE | Sumitomo Rubber Industries, Ltd. (JP) | 2013-12-11 | — | — | EP | disclosed |
| US-20130310512-A1 | RUBBER COMPOSITION AND PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2013-11-21 | — | — | US | disclosed |
| US-20130303679-A1 | RUBBER COMPOSITION AND PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2013-11-14 | — | — | US | disclosed |
| EP-2597116-A1 | RUBBER COMPOSITION AND PNEUMATIC TIRE | Sumitomo Rubber Industries, Ltd. (JP) | 2013-05-29 | — | — | EP | disclosed |
| US-20130085225-A1 | RUBBER COMPOSITION AND PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20120149806-A1 | RUBBER COMPOSITION AND PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES, LTD. | 2012-06-14 | — | — | US | disclosed |
| EP-2463310-A1 | Rubber composition and pneumatic tire | Sumitomo Rubber Industries, Ltd. (JP) | 2012-06-13 | — | — | EP | disclosed |
| US-20110237737-A1 | CONJUGATED DIENE POLYMER RUBBER, AND CONJUGATED DIENE POLYMER RUBBER COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20100056710-A1 | CONJUGATED DIENE POLYMER, CONJUGATED DIENE POLYMER COMPOSITION, AND METHOD FOR PRODUCING CONJUGATED DIENE POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | RPS4X, SIK3, MLX | LMNA 2563/4885POLB 1364/4885TSHR 439/4885 |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | RPS4X, SIK3, MLX | LMNA 2563/4885POLB 1364/4885TSHR 439/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.