Tridecylacetate

Tridecylacetate

SCHEMBL2400935

CCCCCCCCCCCCCOC(C)=O.CCOCC

nearest known ligand 0.68

Full drug profile on Sugi Atlas →

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.68
TSHR P16473 4/20 0.59
NAAA Q02083 1/20 0.55
CES2 O00748 1/20 0.53
EPHX1 P07099 1/20 0.52
HCAR2 Q8TDS4 1/20 0.47
RAD52 P43351 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
LMNA P02545 2/20 0.46
HSD17B10 Q99714 1/20 0.46
FAAH O00519 2/20 0.46
ACHE P22303 3/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Octyl Acetate SCHEMBL4930248 1.00 ALDH1A1 (0.68) ALDH1A1TSHRNAAACES2EPHX1
Acetic Acid Hexadecyl Ester SCHEMBL2863328 1.00 ALDH1A1 (0.68) ALDH1A1TSHRNAAACES2EPHX1
Decylacetate SCHEMBL3426391 1.00 ALDH1A1 (0.68) ALDH1A1TSHRNAAACES2EPHX1
Hexyl Acetate SCHEMBL7690856 1.00 ALDH1A1 (0.68) ALDH1A1TSHRNAAACES2EPHX1
Tetradecylacetate SCHEMBL537712 1.00 ALDH1A1 (0.68) ALDH1A1TSHRNAAACES2EPHX1
Ether SCHEMBL4931894 1.00 ALDH1A1 (0.68) ALDH1A1TSHRNAAACES2EPHX1
Dodecylacetate SCHEMBL353028 1.00 ALDH1A1 (0.68) ALDH1A1TSHRNAAACES2EPHX1
Octyl Acetate SCHEMBL9751176 0.98 ALDH1A1 (0.65) ALDH1A1TSHRNAAACES2EPHX1
Decylacetate SCHEMBL22091864 0.98 ALDH1A1 (0.65) ALDH1A1TSHRNAAACES2EPHX1
Dodecylacetate SCHEMBL515330 0.98 ALDH1A1 (0.65) ALDH1A1TSHRNAAACES2EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12312499-B2 Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment FUJIMI INCORPORATED (JP) 2025-05-27 US disclosed
US-12275921-B2 Treatment liquid and substrate treatment method FUJIFILM CORPORATION (JP) 2025-04-15 US disclosed
US-20230416579-A1 AEROSOL RAW MATERIAL COMPOSITION, AEROSOL COMPOSITION, AND AEROSOL PRODUCT AGC Inc. (JP) 2023-12-28 US disclosed
CN-117015368-A Spray out product 株式会社大造 2023-11-07 CN disclosed
CN-117015586-A Aerosol raw material composition, aerosol composition and aerosol product AGC株式会社 2023-11-07 CN disclosed
CN-113164372-B Salt-sensitive particles 花王株式会社 2023-09-26 CN disclosed
US-20230287304-A1 TREATMENT LIQUID AND SUBSTRATE TREATMENT METHOD FUJIFILM CORPORATION (JP) 2023-09-14 US disclosed
US-20230048722-A1 SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT FUJIMI INCORPORATED (JP) 2023-02-16 US disclosed
WO-2022191203-A1 AEROSOL RAW MATERIAL COMPOSITION, AEROSOL COMPOSITION, AND AEROSOL PRODUCT AGC株式会社 2022-09-15 WO disclosed
CN-114250156-A Culture solution of yeast, method for producing same, skin external preparation, and skin cosmetic 片仓合作农业株式会社 2022-03-29 CN disclosed
US-20050228089-A1 Lubricant for treating elastic fiber SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2005-10-13 US disclosed
US-20050168552-A1 Ink for ink jet recording, ink jet recording method, ink cartridge and ink jet recording apparatus ARITA HITOSHI (JP) 2005-08-04 US disclosed
US-6899751-B2 Ink for ink jet recording, ink jet recording method, ink cartridge and ink jet recording apparatus RICOH COMPANY, LTD. (JP) 2005-05-31 US disclosed
US-20050007431-A1 Pretreatment liquid for recording material and image recording method using the pretreatment liquid KOYANO MASAYUKI (JP) 2005-01-13 US disclosed
US-20040156802-A1 Cosmetics or external preparations for skin AJINOMOTO CO., INC. (JP) 2004-08-12 US disclosed
EP-1374831-A1 COMSETICS OR EXTERNAL PREPARAIOTNS FOR SKIN Ajinomoto Co., Inc. (JP) 2004-01-02 EP disclosed
EP-0782849-B1 Shampoo composition containing pyriproxifen SUMITOMO CHEMICAL CO (JP) 2003-03-19 EP disclosed
US-5866152-A CONTAINING PYRIPROXYFEN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-02 US disclosed
EP-0782849-A1 Shampoo composition containing pyriproxifen SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1997-07-09 EP disclosed
EP-0422683-A1 Washing-off agent composition for dyed cellulose fiber articles NIHON SURFACTANT KOGYO K.K. (JP) 1991-04-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040156802-A1 Cosmetics or external preparations for skin CUTA, PSAP, CTH ALDH1A1 3610/4885TSHR 2753/4885NAAA 182/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.