SCHEMBL2404545

SCHEMBL2404545

CC(C)(C)c1cc([Ba]c2cc(C(C)(C)C)[nH]c2C(C)(C)C)c(C(C)(C)C)[nH]1

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ DAO P14920 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1791619 0.71 ALDH1A1 (0.38) DAO
SCHEMBL4011812 0.71 DAO (0.32) DAO
SCHEMBL19323695 0.70 MAPK14 (0.32) DAO
SCHEMBL1924912 0.70 DAO (0.31) DAO
SCHEMBL1794431 0.70 ALDH1A1 (0.37) DAO
SCHEMBL2405178 0.68 DAO (0.30) DAO
Hydrochloric Acid SCHEMBL8463457 0.68 DAO (0.30) DAO
SCHEMBL1927020 0.67 — —
SCHEMBL14659667 0.67 ABCC9 (0.30) —
Hydrochloric Acid SCHEMBL8535246 0.67 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2322530-B1 Group 4 metal precursors for metal-containing films AIR PROD & CHEM (US) 2016-04-06 — — EP claimed
US-8507704-B2 Liquid composition containing aminoether for deposition of metal-containing films AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-08-13 — — US claimed
US-20110212629-A1 LIQUID COMPOSITION CONTAINING AMINOETHER FOR DEPOSITION OF METAL-CONTAINING FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2011-09-01 — — US claimed
US-8507704-B2 Liquid composition containing aminoether for deposition of metal-containing films AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-08-13 — — US disclosed
US-20110212629-A1 LIQUID COMPOSITION CONTAINING AMINOETHER FOR DEPOSITION OF METAL-CONTAINING FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2011-09-01 — — US disclosed
WO-2009086263-A1 METHODS FOR PREPARING THIN FILMS USING SUBSTITUTED PYRROLYL-METAL PRECURSORS SIGMA-ALDRICH CO. (US) 2009-07-09 — — WO disclosed
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