SCHEMBL241081

SCHEMBL241081

CCOc1ccc(N=Nc2ccc(C(C(=O)O)[Si](OCC)(OCC)OCC)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.47
TDP1 Q9NUW8 2/20 0.47
MAPK1 P28482 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
ALDH1A1 P00352 2/20 0.46
CYP1A2 P05177 1/20 0.46
MEN1 O00255 5/20 0.43
KMT2A Q03164 5/20 0.43
AKR1C3 P42330 1/20 0.43
AKR1C2 P52895 1/20 0.43
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
CNR2 P34972 1/20 0.40
GAA P10253 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
ADRA2A P08913 2/20 0.40
PTGS2 P35354 1/20 0.39
PPARA Q07869 2/20 0.39
PPARG P37231 1/20 0.39
PPARD Q03181 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL243131 0.90 MAPT (0.44) MAPTTDP1MAPK1L3MBTL1KMT2A
SCHEMBL6681010 0.78 KMT2A (0.43) MAPTTDP1MAPK1L3MBTL1ALDH1A1
SCHEMBL28083613 0.74 NAMPT (0.39) MAPTALDH1A1MEN1KMT2AGAA
SCHEMBL11674588 0.74 LMNA (0.50) MAPTTDP1MAPK1L3MBTL1ALDH1A1
SCHEMBL11674599 0.74 LMNA (0.50) MAPTTDP1MAPK1L3MBTL1ALDH1A1
SCHEMBL2455368 0.73 LMNA (0.52) MAPTTDP1MAPK1L3MBTL1ALDH1A1
SCHEMBL2455366 0.73 LMNA (0.52) MAPTTDP1MAPK1L3MBTL1ALDH1A1
SCHEMBL8762877 0.72 NQO1 (0.70) MAPTTDP1MAPK1L3MBTL1ALDH1A1
SCHEMBL8762872 0.72 NQO1 (0.70) MAPTTDP1MAPK1L3MBTL1ALDH1A1
SCHEMBL6130465 0.70 PPARA (0.45) MAPTALDH1A1CYP1A2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103627316-B ARC of filling perforation and photoetching and preparation method thereof 霍尼韦尔国际公司 2016-08-03 CN claimed
US-9069133-B2 Anti-reflective coating for photolithography and methods of preparation thereof HONEYWELL INTERNATIONAL INC. (US) 2015-06-30 US claimed
US-8992806-B2 Antireflective coatings for via fill and photolithography applications and methods of preparation thereof HONEYWELL INTERNATIONAL INC. (US) 2015-03-31 US claimed
US-8889334-B2 Spin-on anti-reflective coatings for photolithography HONEYWELL INTERNATIONAL INC. (US) 2014-11-18 US claimed
US-20140227538-A1 Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof HONEYWELL INTERNATIONAL INC. (US) 2014-08-14 US claimed
US-20130164677-A1 Spin-On Anti-Reflective Coatings for Photolithography HONEYWELL INTERNATIONAL INC. (US) 2013-06-27 US claimed
US-8344088-B2 Spin-on anti-reflective coatings for photolithography HONEYWELL INTERNATIONAL INC. (US) 2013-01-01 US claimed
US-20120001135-A1 Antireflective Coatings for Via Fill and Photolithography Applications and Methods of Preparation Thereof LI BO (US) 2012-01-05 US claimed
US-8053159-B2 Antireflective coatings for via fill and photolithography applications and methods of preparation thereof HONEYWELL INTERNATIONAL INC. (US) 2011-11-08 US claimed
US-20090275694-A1 Spin-on-Glass Anti-Reflective Coatings for Photolithography HONEYWELL INTERNATIONAL INC. (US) 2009-11-05 US claimed
EP-1478681-A1 SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY Honeywell International, Inc. (US) 2004-11-24 EP claimed
EP-1472574-A1 SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY Honeywell International, Inc. (US) 2004-11-03 EP claimed
WO-2004044025-A2 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF HONEYWELL INTERNATIONAL INC (US) 2004-05-27 WO claimed
WO-2003044078-A9 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF HONEYWELL INT INC (US) 2004-01-08 WO claimed
WO-2003044600-A1 SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY HONEYWELL INTERNATIONAL INC. (US) 2003-05-30 WO claimed
WO-2003044079-A1 SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY HONEYWELL INTERNATIONAL INC. (US) 2003-05-30 WO claimed
WO-2003044077-A1 SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY HONEYWELL INTERNATIONAL INC. (US) 2003-05-30 WO claimed
WO-2003044078-A1 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF HONEYWELL INTERNATIONAL INC. (US) 2003-05-30 WO claimed
US-20020128388-A1 Spin-on-glass anti-reflective coatings for photolithography ALLIEDSIGNAL INC. 2002-09-12 US claimed
US-20020095018-A1 Spin-on-glass anti-reflective coatings for photolithography HONEYWELL INTERNATIONAL INC. 2002-07-18 US claimed