SCHEMBL24110488

SCHEMBL24110488

C=Cc1cc(I)c(OC)c(I)c1OC(C)=O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MCL1 Q07820 1/20 0.38
▸ ABCB11 O95342 1/20 0.37
▸ TPMT P51580 1/20 0.36
▸ TUBB4A P04350 2/20 0.35
▸ TUBB P07437 2/20 0.35
▸ TUBA3C P0DPH7 2/20 0.35
▸ TUBA1B P68363 2/20 0.35
▸ TUBA4A P68366 2/20 0.35
▸ TUBB4B P68371 2/20 0.35
▸ TUBB3 Q13509 2/20 0.35
▸ TUBB2A Q13885 2/20 0.35
▸ TUBB8 Q3ZCM7 2/20 0.35
▸ TUBA3E Q6PEY2 2/20 0.35
▸ TUBA1A Q71U36 2/20 0.35
▸ TUBA1C Q9BQE3 2/20 0.35
▸ TUBB6 Q9BUF5 2/20 0.35
▸ TUBB2B Q9BVA1 2/20 0.35
▸ TUBB1 Q9H4B7 2/20 0.35
▸ PTGS1 P23219 1/20 0.35
▸ GRIN2D O15399 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22991507 0.92 POLB (0.35) MCL1ABCB11TUBB4ATUBBTUBA3C
SCHEMBL22991542 0.83 POLB (0.35) MCL1ABCB11TUBB4ATUBBTUBA3C
SCHEMBL24110752 0.82 MTNR1A (0.34) MCL1TPMT
SCHEMBL22991510 0.80 POLB (0.44) ABCB11TUBB4ATUBBTUBA3CTUBA1B
SCHEMBL22991505 0.78 TOP1 (0.37) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL24110760 0.78 TPMT (0.51) ABCB11TPMTTUBB4ATUBBTUBA3C
SCHEMBL24110765 0.77 MCL1 (0.49) MCL1ABCB11TPMTTUBB4ATUBB
SCHEMBL24106257 0.76 ABCB11 (0.43) ABCB11TPMTTUBB4ATUBBTUBA3C
SCHEMBL24110544 0.76 MCL1 (0.39) MCL1TPMT
SCHEMBL22991671 0.75 MCL1 (0.43) MCL1TPMT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
Send feedback