SCHEMBL24110702

SCHEMBL24110702

COc1cc(O)c(I)c(O)c1C=O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ERN1 O75460 12/20 0.54
ALDH1A1 P00352 3/20 0.43
TDP1 Q9NUW8 2/20 0.43
AOX1 Q06278 1/20 0.43
TRIM24 O15164 1/20 0.43
HPGD P15428 1/20 0.43
ALDH5A1 P51649 1/20 0.43
ABAT P80404 1/20 0.43
TRIM33 Q9UPN9 1/20 0.43
KDM4E B2RXH2 1/20 0.41
MEN1 O00255 1/20 0.41
CYP3A4 P08684 1/20 0.41
MAPT P10636 1/20 0.41
CASP1 P29466 1/20 0.41
KMT2A Q03164 1/20 0.41
TLR2 O60603 1/20 0.40
TLR1 Q15399 1/20 0.40
TLR6 Q9Y2C9 1/20 0.40
HTT P42858 1/20 0.38
PRKDC P78527 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25406783 0.83 ERN1 (0.65) ERN1ALDH1A1TDP1AOX1TRIM24
SCHEMBL24110775 0.82 TRPA1 (0.43) ERN1ALDH1A1HPGDKDM4ECYP3A4
SCHEMBL24110719 0.77 PTGS2 (0.44) ALDH1A1TDP1HPGDKDM4EMEN1
SCHEMBL30550256 0.75 CYP3A4 (0.52) ERN1ALDH1A1TDP1AOX1TRIM24
SCHEMBL31232366 0.75 CYP3A4 (0.52) ERN1ALDH1A1TDP1AOX1TRIM24
SCHEMBL26978399 0.73 ERN1 (0.54) ERN1ALDH1A1TDP1AOX1TRIM24
SCHEMBL27998557 0.73 ERN1 (0.56) ERN1ALDH1A1TDP1AOX1TRIM24
SCHEMBL13487014 0.73 ALDH1A1 (0.58) ERN1ALDH1A1TDP1AOX1TRIM24
SCHEMBL21690169 0.73 ERN1 (0.56) ERN1ALDH1A1TDP1AOX1TRIM24
SCHEMBL10333507 0.73 ERN1 (0.62) ERN1ALDH1A1TDP1AOX1TRIM24

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 US disclosed