SCHEMBL24110747

SCHEMBL24110747

COc1c(I)c(OC)c(C=O)c(OC(C)=O)c1I

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ABCB11 O95342 1/20 0.35
▸ FNTA P49354 1/20 0.33
▸ FNTB P49356 1/20 0.33
▸ PDE4A P27815 1/20 0.33
▸ PDE4B Q07343 1/20 0.33
▸ PDE4C Q08493 1/20 0.33
▸ PDE4D Q08499 1/20 0.33
▸ TUBB4A P04350 2/20 0.33
▸ TUBB P07437 2/20 0.33
▸ TUBA3C P0DPH7 2/20 0.33
▸ TUBA1B P68363 2/20 0.33
▸ TUBA4A P68366 2/20 0.33
▸ TUBB4B P68371 2/20 0.33
▸ TUBB3 Q13509 2/20 0.33
▸ TUBB2A Q13885 2/20 0.33
▸ TUBB8 Q3ZCM7 2/20 0.33
▸ TUBA3E Q6PEY2 2/20 0.33
▸ TUBA1A Q71U36 2/20 0.33
▸ TUBA1C Q9BQE3 2/20 0.33
▸ TUBB6 Q9BUF5 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110746 0.79 ELANE (0.34) —
SCHEMBL24110701 0.76 TNFSF11 (0.46) FNTAFNTBTUBB4ATUBBTUBA3C
SCHEMBL27426716 0.76 FNTA (0.35) FNTAFNTB
SCHEMBL24110748 0.76 ERN1 (0.37) IMPDH2
SCHEMBL11782340 0.73 ABCB11 (0.39) ABCB11FNTAFNTBPDE4APDE4B
SCHEMBL24110765 0.70 MCL1 (0.49) ABCB11PDE4APDE4BPDE4CPDE4D
SCHEMBL24110750 0.69 ELANE (0.32) —
SCHEMBL22568074 0.68 CA1 (0.38) IMPDH2
SCHEMBL4588266 0.68 PREP (0.31) —
SCHEMBL12587651 0.67 GRIN2D (0.47) FNTAFNTBTUBB4ATUBBTUBA3C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
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