SCHEMBL24110750

SCHEMBL24110750

COc1c(C)c(OC(=O)OC(C)(C)C)c(C=O)c(OC)c1I

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110746 0.90 ELANE (0.34) ELANE
SCHEMBL24106306 0.77 ELANE (0.31) ELANE
SCHEMBL24110579 0.76 MCL1 (0.43) ELANE
SCHEMBL16785683 0.75 ELANE (0.41) ELANE
SCHEMBL16785684 0.75 ELANE (0.41) ELANE
SCHEMBL24110736 0.73 MTNR1A (0.40) ELANE
SCHEMBL24110747 0.69 ABCB11 (0.35) —
SCHEMBL24110758 0.69 TPMT (0.45) ELANE
SCHEMBL16785679 0.68 CYP3A4 (0.38) ELANE
SCHEMBL499244 0.67 SMN1; SMN2 (0.39) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
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