SCHEMBL24110746

SCHEMBL24110746

COc1c(I)c(OC)c(C=O)c(OC(=O)OC(C)(C)C)c1I

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 1/20 0.34
▸ MTNR1A P48039 1/20 0.30
▸ MTNR1B P49286 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110750 0.90 ELANE (0.32) ELANE
SCHEMBL24110736 0.79 MTNR1A (0.40) ELANEMTNR1AMTNR1B
SCHEMBL24110747 0.79 ABCB11 (0.35) —
SCHEMBL24110758 0.72 TPMT (0.45) ELANEMTNR1AMTNR1B
SCHEMBL24110579 0.71 MCL1 (0.43) ELANEMTNR1AMTNR1B
SCHEMBL24110752 0.71 MTNR1A (0.34) ELANEMTNR1AMTNR1B
SCHEMBL2223556 0.70 ELANE (0.52) ELANE
SCHEMBL24110670 0.70 MTNR1A (0.36) ELANEMTNR1AMTNR1B
SCHEMBL24110748 0.70 ERN1 (0.37) —
SCHEMBL27426725 0.69 ELANE (0.39) ELANEMTNR1AMTNR1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
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