SCHEMBL241265

SCHEMBL241265

CC(C)(C)c1ccccc1/C=C/c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 5/20 0.50
TRPA1 O75762 3/20 0.50
TNFRSF1A P19438 2/20 0.42
CHAT P28329 4/20 0.42
MAOB P27338 2/20 0.41
RELA Q04206 1/20 0.41
ALDH1A1 P00352 1/20 0.40
TSHR P16473 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
CYP19A1 P11511 1/20 0.40
MAOA P21397 1/20 0.40
NR1H2 P55055 1/20 0.40
NR1H3 Q13133 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL241267 1.00 NFE2L2 (0.50) NFE2L2TRPA1TNFRSF1ACHATMAOB
SCHEMBL8576453 0.89 ALDH1A1 (0.48) NFE2L2TRPA1MAOBALDH1A1TSHR
SCHEMBL27459927 0.86 NFE2L2 (0.46) NFE2L2TRPA1TNFRSF1ACHATMAOB
SCHEMBL28340677 0.84 NFE2L2 (0.47) NFE2L2TRPA1CHATMAOBRELA
SCHEMBL6876781 0.83 IP6K1 (0.38) NFE2L2TRPA1TNFRSF1ARELAALDH1A1
SCHEMBL3452696 0.81 ALDH1A1 (0.41) NFE2L2TRPA1TNFRSF1AMAOBALDH1A1
SCHEMBL5492342 0.79 NFKB1 (0.56) NFE2L2TRPA1MAOBMAOA
SCHEMBL5492352 0.79 NFKB1 (0.56) NFE2L2TRPA1MAOBMAOA
SCHEMBL31348027 0.78 ALDH1A1 (0.43) NFE2L2TNFRSF1AMAOBALDH1A1TSHR
SCHEMBL10382469 0.78 ALDH1A1 (0.43) NFE2L2TNFRSF1AMAOBALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7141188-B2 Organic compositions HONEYWELL INTERNATIONAL INC. (US) 2006-11-28 US claimed
EP-1466356-A2 ORGANIC COMPOSITIONS Honeywell International Inc. (US) 2004-10-13 EP claimed
US-20040046155-A1 Organic compositions LI BO (US) 2004-03-11 US claimed
US-20030151031-A1 Organic compositions HONEYWELL INTERNATIONAL INC 2003-08-14 US claimed
WO-2003060979-A2 ORGANIC COMPOSITIONS FOR LOW DIELECTRIC CONSTANT MATERIALS HONEYWELL INTERNATIONAL INC. (US) 2003-07-24 WO claimed
EP-1695142-B1 ANTIREFLECTIVE COATINGS FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF HONEYWELL INT INC (US) 2019-07-31 EP disclosed
US-9069133-B2 Anti-reflective coating for photolithography and methods of preparation thereof HONEYWELL INTERNATIONAL INC. (US) 2015-06-30 US disclosed
US-8992806-B2 Antireflective coatings for via fill and photolithography applications and methods of preparation thereof HONEYWELL INTERNATIONAL INC. (US) 2015-03-31 US disclosed
US-20140227538-A1 Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof HONEYWELL INTERNATIONAL INC. (US) 2014-08-14 US disclosed
US-20120001135-A1 Antireflective Coatings for Via Fill and Photolithography Applications and Methods of Preparation Thereof LI BO (US) 2012-01-05 US disclosed
US-8053159-B2 Antireflective coatings for via fill and photolithography applications and methods of preparation thereof HONEYWELL INTERNATIONAL INC. (US) 2011-11-08 US disclosed
US-7867331-B2 Coating composition optimization for via fill and photolithography applications and methods of preparation thereof HONEYWELL INTERNATIONAL INC. (US) 2011-01-11 US disclosed
WO-2003103020-A2 LAYERED COMPONENTS, MATERIALS, METHODS OF PRODUCTION AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2003-12-11 WO disclosed
WO-2003068447-A1 SOLDER PASTE FORMULATIONS, METHODS OF PRODUCTION AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2003-08-21 WO disclosed
US-20030151031-A1 Organic compositions HONEYWELL INTERNATIONAL INC 2003-08-14 US disclosed
WO-2003060979-A2 ORGANIC COMPOSITIONS FOR LOW DIELECTRIC CONSTANT MATERIALS HONEYWELL INTERNATIONAL INC. (US) 2003-07-24 WO disclosed
WO-2003044078-A1 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF HONEYWELL INTERNATIONAL INC. (US) 2003-05-30 WO disclosed
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US disclosed
US-5817251-A AROMATIC HYDROCARBON LUBRICANT NIPPON OIL CO., LTD. (JP) 1998-10-06 US disclosed
EP-0717098-A2 A refrigerating machine oil and a fluid composition for use in a refrigerating machine NIPPON OIL CO. LTD. (JP) 1996-06-19 EP disclosed