Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | MGLL | Q99685 | 2/20 | 0.35 |
| ▸ | SLC1A3 | P43003 | 4/20 | 0.34 |
| ▸ | SLC1A2 | P43004 | 4/20 | 0.34 |
| ▸ | SLC1A1 | P43005 | 4/20 | 0.34 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.34 |
| ▸ | PARP10 | Q53GL7 | 3/20 | 0.33 |
| ▸ | PARP15 | Q460N3 | 2/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.32 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.32 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.32 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24142224 | 0.98 | LMNA (0.46) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL24142192 | 0.84 | EPHX1 (0.37) | LMNACHRM3EPHX1MEN1KMT2A | |
| SCHEMBL24142194 | 0.82 | EPHX1 (0.40) | LMNACHRM3EPHX1PDK1PDK2 | |
| SCHEMBL10150825 | 0.81 | LMNA (0.50) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL24177860 | 0.81 | EPHX1 (0.45) | EPHX1 | |
| SCHEMBL685740 | 0.79 | LMNA (0.44) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL12018633 | 0.78 | LMNA (0.47) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL685931 | 0.78 | LMNA (0.47) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL686028 | 0.78 | LMNA (0.47) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL686209 | 0.78 | LMNA (0.47) | LMNAMGLLSLC1A3SLC1A2SLC1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20230021453-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
| US-20220004100-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-06 | — | — | US | disclosed |
| US-20220004101-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-06 | — | — | US | disclosed |
| US-20210405528-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | HNRNPU, NSUN2, HNRNPR | LMNA 2930/4885MGLL 4106/4885SLC1A3 1849/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.