Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | MGLL | Q99685 | 2/20 | 0.38 |
| ▸ | SLC1A3 | P43003 | 3/20 | 0.37 |
| ▸ | SLC1A2 | P43004 | 3/20 | 0.37 |
| ▸ | SLC1A1 | P43005 | 3/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.35 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.35 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.35 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.35 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.35 |
| ▸ | PARP15 | Q460N3 | 1/20 | 0.35 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL686209 | 1.00 | LMNA (0.47) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL686028 | 1.00 | LMNA (0.47) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL685740 | 0.98 | LMNA (0.44) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL685910 | 0.94 | LMNA (0.41) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL685175 | 0.90 | LIPA (0.37) | LMNASLC1A3SLC1A2SLC1A1 | |
| SCHEMBL686289 | 0.89 | LMNA (0.49) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL2906290 | 0.85 | LMNA (0.50) | LMNASLC1A3SLC1A2SLC1A1MEN1 | |
| SCHEMBL10150825 | 0.85 | LMNA (0.50) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL17281558 | 0.84 | LMNA (0.44) | LMNAMGLLSLC1A3SLC1A2SLC1A1 | |
| SCHEMBL13174297 | 0.84 | LMNA (0.37) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 288 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-12-12 | — | — | US | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822241-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820735-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11815813-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-11782342-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-10 | — | — | US | disclosed |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20110053082-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20110039208-A1 | PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20110039209-A1 | COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20110033804-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20110014567-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20110014566-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100330497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100316951-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100316952-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20080081925-A1 | Sulfonium compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (14 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100316951-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | THEM6, INTS6, CRY1 | LMNA 2959/4885MGLL 3908/4885SLC1A3 635/4885 |
| US-20080081925-A1 | Sulfonium compound | SLCO2A1, AFF2, SLCO2B1 | LMNA 2974/4885MGLL 3324/4885SLC1A3 1237/4885 |
| US-11820735-B2 | Salt, acid generator, resist composition and method for producing resist pattern | RER1, LPAR1, TLR7 | LMNA 1795/4885MGLL 854/4885SLC1A3 756/4885 |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | LMNA 4690/4885MGLL 1232/4885SLC1A3 1015/4885 |
| US-11782342-B2 | Salt and photoresist composition containing the same | CRY1, REN, SLC6A19 | LMNA 3499/4885MGLL 1482/4885SLC1A3 153/4885 |
| US-20100316952-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | AFF1, AFF2, AFF4 | LMNA 1377/4885MGLL 3710/4885SLC1A3 465/4885 |
| US-20110014567-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | XPA, XPOT, ERCC4 | LMNA 547/4885MGLL 4217/4885SLC1A3 1550/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | LMNA 3320/4885MGLL 2235/4885SLC1A3 3818/4885 |
| US-20110014566-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | XPA, NPPA, ERCC4 | LMNA 444/4885MGLL 4526/4885SLC1A3 1314/4885 |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | HCAR1, H1-0, H1-10 | LMNA 4546/4885MGLL 2301/4885SLC1A3 2345/4885 |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, H1-2 | LMNA 4023/4885MGLL 855/4885SLC1A3 1904/4885 |
| US-11822241-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, CHRM1 | LMNA 3440/4885MGLL 737/4885SLC1A3 1696/4885 |
| US-20110039209-A1 | COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME | RCOR3, RCN1, HRH4 | LMNA 4120/4885MGLL 4480/4885SLC1A3 1304/4885 |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | RER1, H1-0, CA7 | LMNA 4757/4885MGLL 1009/4885SLC1A3 2233/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.