Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.53 |
| ▸ | MAOA | P21397 | 3/20 | 0.52 |
| ▸ | MAOB | P27338 | 3/20 | 0.52 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.46 |
| ▸ | MMP3 | P08254 | 1/20 | 0.46 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | MGLL | Q99685 | 1/20 | 0.45 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.43 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5713298 | 1.00 | ALDH1A1 (0.53) | ALDH1A1MAOAMAOBHPGDHSD17B10 | |
| SCHEMBL27902166 | 0.97 | ALDH1A1 (0.56) | ALDH1A1MAOAMAOBHPGDHSD17B10 | |
| SCHEMBL28209874 | 0.97 | ALDH1A1 (0.56) | ALDH1A1MAOAMAOBHPGDHSD17B10 | |
| SCHEMBL28033978 | 0.97 | ALDH1A1 (0.56) | ALDH1A1MAOAMAOBHPGDHSD17B10 | |
| SCHEMBL21603033 | 0.97 | ALDH1A1 (0.56) | ALDH1A1MAOAMAOBHPGDHSD17B10 | |
| SCHEMBL8516000 | 0.97 | ALDH1A1 (0.56) | ALDH1A1MAOAMAOBHPGDHSD17B10 | |
| SCHEMBL2754909 | 0.97 | MAOA (0.54) | ALDH1A1MAOAMAOBHPGDHSD17B10 | |
| SCHEMBL10705269 | 0.97 | MAOA (0.54) | ALDH1A1MAOAMAOBHPGDHSD17B10 | |
| Diphenylsulfane SCHEMBL3208884 | 0.94 | ALDH1A1 (0.60) | ALDH1A1MAOAMAOBHPGDHSD17B10 | |
| Diphenylsulfane SCHEMBL27671477 | 0.91 | ALDH1A1 (0.56) | ALDH1A1MAOAMAOBHPGDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070098994-A1 | Imaging member having sulfur-containing additive | XEROX CORPORATION (US) | 2007-05-03 | — | — | US | claimed |
| US-4044056-A | Symmetrical aromatic sulfide production | PHILLIPS PETROLEUM COMPANY (US) | 1977-08-23 | — | — | US | claimed |
| CN-119462447-A | Method for synthesizing aryl thioether compound | 常州大学 | 2025-02-18 | — | — | CN | disclosed |
| CN-114901638-B | Sulfonium salt, photoacid generator, curable composition, and resist composition | 三亚普罗股份有限公司 | 2024-10-29 | — | — | CN | disclosed |
| CN-117924131-A | Green preparation method for synthesizing asymmetric thioether and derivative thereof by taking benzenesulfonyl hydrazine compounds as sulfur source | 常州大学 | 2024-04-26 | — | — | CN | disclosed |
| CN-116635788-A | Photosensitive dry film, laminated film, method for producing laminated film, and method for producing patterned resist film | 东京应化工业株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-116157739-A | Chemically amplified photosensitive composition, photosensitive dry film, method for producing substrate with plating mold, and method for producing plating molded article | 东京应化工业株式会社 | 2023-05-23 | — | — | CN | disclosed |
| US-20230100642-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION | SAN-APRO LTD. (JP) | 2023-03-30 | — | — | US | disclosed |
| CN-111788181-B | Sulfonium salt, photoacid generator, curable composition, and resist composition | 三亚普罗股份有限公司 | 2023-01-17 | — | — | CN | disclosed |
| US-20220308448-A1 | PHOTOACID GENERATOR FOR CHEMICALLY AMPLIFIED PHOTORESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2022-09-29 | — | — | US | disclosed |
| CN-114901638-A | Sulfonium salt, photoacid generator, curable composition, and resist composition | 三亚普罗股份有限公司 | 2022-08-12 | — | — | CN | disclosed |
| US-20150118621-A1 | METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |
| EP-2235029-B1 | NICKEL COMPLEXING COMPOUNDS CONTAINING DIARYL SULFIDE LIGANDS | BASF SE (DE) | 2011-09-21 | — | — | EP | disclosed |
| US-7838189-B2 | Imaging member having sulfur-containing additive | XEROX CORPORATION (US) | 2010-11-23 | — | — | US | disclosed |
| EP-2235029-A1 | NICKEL COMPLEXING COMPOUNDS CONTAINING DIARYL SULFIDE LIGANDS | BASF SE (DE) | 2010-10-06 | — | — | EP | disclosed |
| WO-2009083435-A1 | NICKEL COMPLEXING COMPOUNDS CONTAINING DIARYL SULFIDE LIGANDS | BASF SE (DE) | 2009-07-09 | — | — | WO | disclosed |
| US-20070098994-A1 | Imaging member having sulfur-containing additive | XEROX CORPORATION (US) | 2007-05-03 | — | — | US | disclosed |
| EP-0317226-A2 | Aromatic compounds | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1989-05-24 | — | — | EP | disclosed |
| EP-0279217-A1 | Process for the preparation of poly(arylensulfides) with adjustable melt viscosity | BAYER AG (DE) | 1988-08-24 | — | — | EP | disclosed |
| US-4044056-A | Symmetrical aromatic sulfide production | PHILLIPS PETROLEUM COMPANY (US) | 1977-08-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230100642-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION | TIPRL, SPIN1, SPIN2B | ALDH1A1 2594/4885MAOA 4671/4885MAOB 4673/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.