SCHEMBL24177750

SCHEMBL24177750

O=C(CN1CCOCC1)Oc1cccc2ccccc12

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 1/20 0.58
▸ CYP2C19 P33261 1/20 0.58
▸ KDM4E B2RXH2 4/20 0.57
▸ MAPT P10636 4/20 0.57
▸ ALDH1A1 P00352 2/20 0.57
▸ SMN1; SMN2 Q16637 2/20 0.57
▸ HTT P42858 2/20 0.50
▸ CNR1 P21554 2/20 0.49
▸ CNR2 P34972 1/20 0.49
▸ KMT2A Q03164 4/20 0.48
▸ MEN1 O00255 2/20 0.48
▸ POLB P06746 1/20 0.48
▸ ABCB1 P08183 2/20 0.47
▸ RAB9A P51151 2/20 0.47
▸ L3MBTL1 Q9Y468 2/20 0.47
▸ GAA P10253 2/20 0.46
▸ TDP1 Q9NUW8 2/20 0.46
▸ USP2 O75604 1/20 0.46
▸ LMNA P02545 1/20 0.46
▸ NPC1 O15118 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3796068 0.87 CYP2C19 (0.56) CYP1A2CYP2C19KDM4EMAPTALDH1A1
SCHEMBL27974790 0.86 HRH3 (0.52) CYP1A2CYP2C19KDM4EMAPTALDH1A1
SCHEMBL24177785 0.83 ALDH1A1 (0.53) CYP1A2CYP2C19KDM4EMAPTALDH1A1
SCHEMBL23199817 0.81 ALDH1A1 (0.51) CYP1A2CYP2C19KDM4EMAPTALDH1A1
Hydrochloric Acid SCHEMBL23199801 0.80 ALDH1A1 (0.50) CYP1A2CYP2C19KDM4EMAPTALDH1A1
SCHEMBL24177753 0.79 KDM4E (0.55) KDM4EMAPTALDH1A1SMN1; SMN2HTT
SCHEMBL20886933 0.79 TP53 (0.74) CYP1A2CYP2C19KDM4EALDH1A1SMN1; SMN2
SCHEMBL24177783 0.77 KMT2A (0.58) KDM4EMAPTALDH1A1SMN1; SMN2HTT
SCHEMBL24177770 0.77 SMN1; SMN2 (0.56) CYP1A2CYP2C19KDM4EMAPTALDH1A1
SCHEMBL20887125 0.74 CYP1A2 (0.50) CYP1A2CYP2C19KDM4EMAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152692-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
US-20230152692-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
US-20220004101-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-01-06 — — US disclosed
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