SCHEMBL24177753

SCHEMBL24177753

O=C(CN1CCOCC1)OCc1cccc2ccccc12

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 4/20 0.55
▸ MAPT P10636 4/20 0.55
▸ SMN1; SMN2 Q16637 2/20 0.55
▸ ALDH1A1 P00352 2/20 0.55
▸ KMT2A Q03164 3/20 0.52
▸ MEN1 O00255 2/20 0.52
▸ POLB P06746 1/20 0.52
▸ USP2 O75604 2/20 0.52
▸ TSHR P16473 1/20 0.52
▸ HSD17B10 Q99714 1/20 0.52
▸ LMNA P02545 2/20 0.51
▸ L3MBTL1 Q9Y468 2/20 0.50
▸ NPSR1 Q6W5P4 2/20 0.49
▸ EPHX1 P07099 1/20 0.48
▸ HTT P42858 2/20 0.48
▸ GAA P10253 2/20 0.47
▸ TDP1 Q9NUW8 2/20 0.47
▸ NPFFR1 Q9GZQ6 1/20 0.47
▸ NPFFR2 Q9Y5X5 1/20 0.47
▸ CNR1 P21554 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24177755 0.82 KMT2A (0.52) KDM4EMAPTSMN1; SMN2ALDH1A1KMT2A
SCHEMBL24177750 0.79 CYP1A2 (0.58) KDM4EMAPTSMN1; SMN2ALDH1A1KMT2A
SCHEMBL1128242 0.78 MEN1 (0.71) MAPTSMN1; SMN2ALDH1A1KMT2AMEN1
SCHEMBL14860480 0.74 DRD2 (0.55) KDM4EMAPTSMN1; SMN2ALDH1A1KMT2A
SCHEMBL4106102 0.74 ALDH1A1 (0.68) KDM4EMAPTALDH1A1KMT2AMEN1
SCHEMBL23199817 0.73 ALDH1A1 (0.51) KDM4EMAPTSMN1; SMN2ALDH1A1KMT2A
SCHEMBL7272341 0.73 SMN1; SMN2 (0.55) KDM4EMAPTSMN1; SMN2ALDH1A1KMT2A
SCHEMBL8400366 0.73 EPHX1 (0.51) KDM4EALDH1A1KMT2AMEN1HSD17B10
SCHEMBL23932603 0.73 MEN1 (0.52) ALDH1A1KMT2AMEN1L3MBTL1EPHX1
Hydrochloric Acid SCHEMBL23199801 0.72 ALDH1A1 (0.50) KDM4EMAPTSMN1; SMN2ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152692-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
US-20230152692-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
US-20220004101-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-01-06 — — US disclosed
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