Known targets — ChEMBL curated mechanism
ADORA1ADORA2AADORA2BADORA3PDE3APDE3BPDE4APDE4BPDE4CPDE4D
The experimentally established mechanism targets of Medronic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDE3A known ✓ | Q14432 | 2/20 | 0.39 |
| ▸ | PDE4D known ✓ | Q08499 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.71 |
| ▸ | MMP2 | P08253 | 1/20 | 0.71 |
| ▸ | THRB | P10828 | 1/20 | 0.71 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.71 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.71 |
| ▸ | OTC | P00480 | 1/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.56 |
| ▸ | LMNA | P02545 | 3/20 | 0.50 |
| ▸ | BLM | P54132 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.50 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.50 |
| ▸ | ANPEP | P15144 | 2/20 | 0.43 |
| ▸ | ERAP2 | Q6P179 | 1/20 | 0.43 |
| ▸ | GABBR2 | O75899 | 4/20 | 0.42 |
| ▸ | GABBR1 | Q9UBS5 | 4/20 | 0.42 |
| ▸ | FDPS | P14324 | 2/20 | 0.39 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Medronic Acid SCHEMBL1485658 | 1.00 | KDM4E (0.71) | KDM4EMMP2THRBMAPK1HSD17B10 | |
| Medronic Acid SCHEMBL12492957 | 1.00 | KDM4E (0.71) | KDM4EMMP2THRBMAPK1HSD17B10 | |
| Medronic Acid SCHEMBL19350137 | 1.00 | KDM4E (0.71) | KDM4EMMP2THRBMAPK1HSD17B10 | |
| Medronic Acid SCHEMBL78977 | 1.00 | KDM4E (0.71) | KDM4EMMP2THRBMAPK1HSD17B10 | |
| Medronic Acid SCHEMBL7743864 | 1.00 | KDM4E (0.71) | KDM4EMMP2THRBMAPK1HSD17B10 | |
| Medronic Acid SCHEMBL2353950 | 1.00 | KDM4E (0.71) | KDM4EMMP2THRBMAPK1HSD17B10 | |
| Medronic Acid SCHEMBL9550946 | 1.00 | KDM4E (0.71) | KDM4EMMP2THRBMAPK1HSD17B10 | |
| Medronic Acid SCHEMBL2823010 | 1.00 | KDM4E (0.71) | KDM4EMMP2THRBMAPK1HSD17B10 | |
| Medronic Acid SCHEMBL1707898 | 1.00 | KDM4E (0.71) | KDM4EMMP2THRBMAPK1HSD17B10 | |
| Medronic Acid SCHEMBL3863755 | 0.97 | KDM4E (0.67) | KDM4EMMP2THRBMAPK1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2287441-A2 | Oil and gas field chemicals | INEOS EUROPE LIMITED (GB) | 2011-02-23 | — | — | EP | claimed |
| EP-0812011-B1 | Cleaning agent | WAKO PURE CHEM IND LTD (JP) | 2005-04-27 | — | — | EP | claimed |
| US-6514921-B1 | Cleaning agent | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2003-02-04 | — | — | US | claimed |
| US-20010018407-A1 | Cleaning agent | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2001-08-30 | — | — | US | claimed |
| EP-0812011-A2 | Cleaning agent | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 1997-12-10 | — | — | EP | claimed |
| JP-8208577-A | — | — | None | — | — | JP | disclosed |
| US-12012658-B2 | Composition, kit, and method for treating substrate | FUJIFILM CORPORATION (JP) | 2024-06-18 | — | — | US | disclosed |
| US-11767595-B2 | Chemical liquid, chemical liquid container, and method for treating substrate | FUJIFILM CORPORATION (JP) | 2023-09-26 | — | — | US | disclosed |
| US-20230160072-A1 | CHEMICAL LIQUID, CHEMICAL LIQUID CONTAINER, AND METHOD FOR TREATING SUBSTRATE | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230088854-A1 | CLEANING LIQUID AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE | FUJIFILM CORPORATION (JP) | 2023-03-23 | — | — | US | disclosed |
| US-20220403300-A1 | CLEANING LIQUID AND CLEANING METHOD | FUJIFILM CORPORATION (JP) | 2022-12-22 | — | — | US | disclosed |
| US-20220177814-A1 | CLEANING SOLUTION AND CLEANING METHOD | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| EP-1679361-A1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-12 | — | — | EP | disclosed |
| EP-1676820-A1 | LIQUID QUICK-SETTING ADMIXTURE, SHOTCRETING MATERIAL AND METHOD FOR SHOTCRETING USING THEM | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2006-07-05 | — | — | EP | disclosed |
| EP-0812011-B1 | Cleaning agent | WAKO PURE CHEM IND LTD (JP) | 2005-04-27 | — | — | EP | disclosed |
| US-6514921-B1 | Cleaning agent | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20010018407-A1 | Cleaning agent | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| US-6143705-A | TREATING SEMICONDUCTOR SURFACE WITH CLEANING AGENT CONSISTING OF ORGANIC ACID HAVING AND COMPLEXING AGENT OTHER THAN ORGANIC ACID HAVING CHELATING ABILITY TO REMOVE METALLIC CONTAMINANTS ON SUBSTRATE SURFACE WITHOUT CORRODING METALLIZED WIRINGS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-0812011-A2 | Cleaning agent | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 1997-12-10 | — | — | EP | disclosed |
| JP-H08208577-A | STABILIZATION | WAKO PURE CHEM IND LTD | 1996-08-13 | — | — | JP | disclosed |