SCHEMBL24225980

SCHEMBL24225980

CC(=O)OCC#Cc1ccc2c3c(cccc13)C(O)N(OS(=O)(=O)C(F)(F)F)C2=O

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 1/20 0.31
▸ POLB P06746 1/20 0.31
▸ MAPT P10636 1/20 0.31
▸ KMT2A Q03164 1/20 0.31
▸ L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19135192 0.85 NOD2 (0.31) —
SCHEMBL18069176 0.84 KMT2A (0.41) MEN1POLBMAPTKMT2AL3MBTL1
SCHEMBL18576631 0.82 MEN1 (0.34) MEN1POLBMAPTKMT2AL3MBTL1
SCHEMBL18069152 0.75 MAPT (0.40) MEN1POLBMAPTKMT2AL3MBTL1
SCHEMBL19015041 0.75 BRD4 (0.33) MEN1POLBMAPTKMT2AL3MBTL1
SCHEMBL18069205 0.75 KMT2A (0.42) MEN1POLBMAPTKMT2AL3MBTL1
SCHEMBL18069188 0.74 KMT2A (0.49) MEN1POLBMAPTKMT2A
SCHEMBL18069157 0.73 MAPT (0.38) MEN1POLBMAPTKMT2AL3MBTL1
SCHEMBL18071769 0.72 ELANE (0.38) MEN1POLBMAPTKMT2AL3MBTL1
SCHEMBL18069151 0.72 MAPT (0.38) MEN1POLBMAPTKMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220026801-A1 CHEMICALLY AMPLIFIED POSITIVE -TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD (JP) 2022-01-27 — — US disclosed
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