Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARA | Q07869 | 13/20 | 0.48 |
| ▸ | PPARD | Q03181 | 9/20 | 0.43 |
| ▸ | PPARG | P37231 | 4/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL240682 | 0.93 | ALDH1A1 (0.44) | PPARAPPARDPPARG | |
| SCHEMBL239068 | 0.88 | CES2 (0.43) | PPARAPPARD | |
| SCHEMBL6130464 | 0.78 | PPARA (0.44) | PPARAPPARD | |
| SCHEMBL6130465 | 0.77 | PPARA (0.45) | PPARAPPARDPPARG | |
| SCHEMBL28964341 | 0.72 | CYP2C9 (0.58) | PPARATSHR | |
| SCHEMBL28964340 | 0.72 | CYP2C9 (0.58) | PPARATSHR | |
| SCHEMBL31742290 | 0.72 | PLA2G4B (0.58) | PPARATP53TSHRPLA2G4B | |
| SCHEMBL240934 | 0.72 | PPARA (0.46) | PPARAPPARDPPARG | |
| SCHEMBL18409047 | 0.70 | PPARA (0.54) | PPARAPPARD | |
| SCHEMBL11184944 | 0.70 | TP53 (0.79) | TP53TSHRPLA2G4B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090275694-A1 | Spin-on-Glass Anti-Reflective Coatings for Photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2009-11-05 | — | — | US | claimed |
| EP-1478681-A4 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INT INC (US) | 2006-10-11 | — | — | EP | claimed |
| EP-1478681-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | Honeywell International, Inc. (US) | 2004-11-24 | — | — | EP | claimed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | claimed |
| EP-1695142-B1 | ANTIREFLECTIVE COATINGS FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF | HONEYWELL INT INC (US) | 2019-07-31 | — | — | EP | disclosed |
| US-9069133-B2 | Anti-reflective coating for photolithography and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-06-30 | — | — | US | disclosed |
| US-8992806-B2 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-03-31 | — | — | US | disclosed |
| US-8889334-B2 | Spin-on anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20140227538-A1 | Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-08-14 | — | — | US | disclosed |
| US-8642246-B2 | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-02-04 | — | — | US | disclosed |
| US-20130164677-A1 | Spin-On Anti-Reflective Coatings for Photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2013-06-27 | — | — | US | disclosed |
| US-8344088-B2 | Spin-on anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2013-01-01 | — | — | US | disclosed |
| EP-1472574-A1 | SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | Honeywell International, Inc. (US) | 2004-11-03 | — | — | EP | disclosed |
| WO-2004044025-A2 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INTERNATIONAL INC (US) | 2004-05-27 | — | — | WO | disclosed |
| WO-2003044078-A9 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INT INC (US) | 2004-01-08 | — | — | WO | disclosed |
| WO-2003044078-A1 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044079-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044600-A1 | SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| US-20020095018-A1 | Spin-on-glass anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. | 2002-07-18 | — | — | US | disclosed |