Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARA | Q07869 | 6/20 | 0.46 |
| ▸ | PPARD | Q03181 | 4/20 | 0.46 |
| ▸ | CES2 | O00748 | 2/20 | 0.44 |
| ▸ | ACHE | P22303 | 2/20 | 0.44 |
| ▸ | CES1 | P23141 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 4/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | ELANE | P08246 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | APEX1 | P27695 | 1/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.38 |
| ▸ | PPARG | P37231 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6130465 | 0.90 | PPARA (0.45) | PPARAPPARDMAPTNPC1RAB9A | |
| SCHEMBL239068 | 0.84 | CES2 (0.43) | PPARAPPARDCES2ACHECES1 | |
| SCHEMBL27908528 | 0.77 | CYP2C19 (0.42) | MAPTKMT2AALDH1A1ALOX15HDAC1 | |
| SCHEMBL6130464 | 0.75 | PPARA (0.44) | PPARAPPARDCES2ACHECES1 | |
| SCHEMBL240682 | 0.73 | ALDH1A1 (0.44) | PPARAPPARDMAPTMAPK1TDP1 | |
| SCHEMBL242443 | 0.72 | PPARA (0.48) | PPARAPPARDPPARG | |
| SCHEMBL243131 | 0.70 | MAPT (0.44) | PPARAPPARDCES2ACHECES1 | |
| SCHEMBL9863577 | 0.68 | MAPT (0.51) | PPARAPPARDCES2ACHECES1 | |
| SCHEMBL14791146 | 0.67 | ELANE (0.61) | PPARAPPARDCES2ACHECES1 | |
| SCHEMBL11117316 | 0.67 | ALDH1A1 (0.50) | PPARACES2CES1MAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090275694-A1 | Spin-on-Glass Anti-Reflective Coatings for Photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2009-11-05 | — | — | US | claimed |
| EP-1478681-A4 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INT INC (US) | 2006-10-11 | — | — | EP | claimed |
| EP-1478681-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | Honeywell International, Inc. (US) | 2004-11-24 | — | — | EP | claimed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | claimed |
| EP-1695142-B1 | ANTIREFLECTIVE COATINGS FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF | HONEYWELL INT INC (US) | 2019-07-31 | — | — | EP | disclosed |
| US-9069133-B2 | Anti-reflective coating for photolithography and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-06-30 | — | — | US | disclosed |
| US-8992806-B2 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-03-31 | — | — | US | disclosed |
| US-8889334-B2 | Spin-on anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20140227538-A1 | Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-08-14 | — | — | US | disclosed |
| US-8642246-B2 | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-02-04 | — | — | US | disclosed |
| US-20130164677-A1 | Spin-On Anti-Reflective Coatings for Photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2013-06-27 | — | — | US | disclosed |
| US-8344088-B2 | Spin-on anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2013-01-01 | — | — | US | disclosed |
| EP-1472574-A1 | SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | Honeywell International, Inc. (US) | 2004-11-03 | — | — | EP | disclosed |
| WO-2004044025-A2 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INTERNATIONAL INC (US) | 2004-05-27 | — | — | WO | disclosed |
| WO-2003044078-A9 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INT INC (US) | 2004-01-08 | — | — | WO | disclosed |
| WO-2003044078-A1 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044600-A1 | SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044079-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| US-20020095018-A1 | Spin-on-glass anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. | 2002-07-18 | — | — | US | disclosed |