Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | TP53 | P04637 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.34 |
| ▸ | MGLL | Q99685 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | DRD1 | P21728 | 1/20 | 0.33 |
| ▸ | FAAH | O00519 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31290756 | 1.00 | ALDH1A1 (0.41) | ALDH1A1TP53TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL1357316 | 0.86 | ALDH1A1 (0.40) | ALDH1A1TP53TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL7925280 | 0.85 | ATM (0.38) | ALDH1A1LMNA | |
| SCHEMBL3751458 | 0.84 | ALDH1A1 (0.46) | ALDH1A1TP53TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL730323 | 0.84 | TSHR (0.52) | ALDH1A1TP53TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL14397248 | 0.84 | TSHR (0.52) | ALDH1A1TP53TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL9331235 | 0.84 | ALDH1A1 (0.42) | ALDH1A1TP53TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL24172680 | 0.82 | ALDH1A1 (0.45) | ALDH1A1TP53TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL239227 | 0.81 | ALDH1A1 (0.46) | ALDH1A1TP53TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL6574231 | 0.81 | TP53 (0.47) | ALDH1A1TP53TSHRCYP3A4SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1595 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4619470-A1 | SILANE COMPOUND AND COMPOSITIONS CONTAINING SAME | Synthomer Sdn. Bhd. (MY) | 2025-09-24 | — | — | EP | claimed |
| US-20250242558-A1 | METHOD FOR REPAIRING OR RECYCLING AN ELASTOMERIC FILM | SYNTHOMER SDN. BHD. (MY) | 2025-07-31 | — | — | US | claimed |
| US-12365153-B2 | Method for repairing or recycling an elastomeric film | SYNTHOMER SDN. BHD. (MY) | 2025-07-22 | — | — | US | claimed |
| CN-120202247-A | Silane compound and composition containing same | 昕特玛私人有限公司 | 2025-06-24 | — | — | CN | claimed |
| CN-113347939-B | Self-supporting elastomeric films with self-healing properties made from polymer latex | 昕特玛(英国)有限公司 | 2025-06-03 | — | — | CN | claimed |
| CN-113365570-B | Polymer latex and elastomeric film with self-healing properties made therefrom | 昕特玛(英国)有限公司 | 2025-05-30 | — | — | CN | claimed |
| EP-3464453-B1 | POLYMER LATEX FOR DIP-MOLDING APPLICATIONS | SYNTHOMER SDN BHD (MY) | 2025-04-16 | — | — | EP | claimed |
| CN-119805862-A | Colored photosensitive resin composition, color filter, developing device and preparation method | 阜阳欣奕华新材料科技股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-112241107-B | Positive photosensitive resin composition, photosensitive resin film and display device using the same | 株式会社东进世美肯 | 2025-03-11 | — | — | CN | claimed |
| US-12234334-B2 | Self-supported elastomeric film having self-healing properties made from a polymer latex | SYNTHOMER (UK) LIMITED (GB) | 2025-02-25 | — | — | US | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| US-20080176169-A1 | BINDER COMPOSITION AND PHOTOSENSITIVE COMPOSITION INCLUDING THE SAME | ICF TECHNOLOGY LIMITED. (US) | 2008-07-24 | — | — | US | claimed |
| US-7371499-B2 | Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-05-13 | — | — | US | claimed |
| US-20070128540-A1 | PHOTORESIST RESIN COMPOSITION, METHOD OF FORMING A PHOTORESIST PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-07 | — | — | US | claimed |
| US-20060275700-A1 | Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same | SAMSUNG ELECTRONICS CO., LTD. | 2006-12-07 | — | — | US | claimed |
| US-7101650-B2 | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO., LTD. (KR) | 2006-09-05 | — | — | US | claimed |
| US-20050042536-A1 | Photosensitive resin composition comprising quinonediazide sulfate ester compound | DONGJIN SEMICHEM CO. LTD. (KR) | 2005-02-24 | — | — | US | claimed |
| US-20040248030-A1 | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-12-09 | — | — | US | claimed |
| WO-2003036388-A1 | PHOTOSNESITIVE RESIN COMPOSITION COMPRISING QUINONEDIAZIDE SULFATE ESTER COMPOUND | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-05-01 | — | — | WO | claimed |
| WO-2003017001-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTORESIST | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-02-27 | — | — | WO | claimed |