Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EIF4A3 | P38919 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 4/20 | 0.37 |
| ▸ | RAB9A | P51151 | 4/20 | 0.37 |
| ▸ | TP53 | P04637 | 2/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | KIF11 | P52732 | 1/20 | 0.37 |
| ▸ | SCN10A | Q9Y5Y9 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | SCN4A | P35499 | 1/20 | 0.35 |
| ▸ | HTR1D | P28221 | 2/20 | 0.35 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.34 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.34 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.34 |
| ▸ | TYR | P14679 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19523306 | 0.85 | — | — | |
| SCHEMBL11659128 | 0.85 | — | — | |
| SCHEMBL21104304 | 0.85 | — | — | |
| SCHEMBL7968994 | 0.85 | SCN10A (0.43) | EIF4A3NPC1RAB9ATP53NPSR1 | |
| SCHEMBL30462995 | 0.85 | KIF11 (0.37) | KIF11 | |
| Hydrochloric Acid SCHEMBL3932764 | 0.84 | ADRB2 (0.34) | SCN10A | |
| SCHEMBL4636201 | 0.82 | SCN10A (0.42) | TP53SCN10ALMNAKDM4EALDH1A1 | |
| SCHEMBL5014500 | 0.81 | — | — | |
| SCHEMBL23680086 | 0.81 | — | — | |
| SCHEMBL24171458 | 0.80 | SCN10A (0.32) | SCN10A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 375 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3774680-B1 | CLEANING COMPOSITIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-09-24 | — | — | EP | claimed |
| US-12187984-B2 | Treatment liquid and method for treating object to be treated | FUJIFILM CORPORATION (JP) | 2025-01-07 | — | — | US | claimed |
| US-12139693-B2 | Treatment liquid and method for treating object to be treated | FUJIFILM CORPORATION (JP) | 2024-11-12 | — | — | US | claimed |
| EP-3672944-B1 | CLEANING COMPOSITIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2024-08-07 | — | — | EP | claimed |
| US-20240174924-A1 | ETCHING COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-05-30 | — | — | US | claimed |
| CN-114364779-B | Treatment liquid and method for treating object to be treated | 富士胶片株式会社 | 2024-05-28 | — | — | CN | claimed |
| EP-3719105-B1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MAT USA INC (US) | 2023-09-27 | — | — | EP | claimed |
| CN-110997643-B | Cleaning composition | 富士胶片电子材料美国有限公司 | 2023-06-06 | — | — | CN | claimed |
| US-20230159864-A1 | TREATMENT LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | claimed |
| CN-111902379-B | Cleaning composition | 富士胶片电子材料美国有限公司 | 2023-02-17 | — | — | CN | claimed |
| EP-3060642-A1 | CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES | FujiFilm Electronic Materials USA, Inc. (US) | 2016-08-31 | — | — | EP | claimed |
| CN-105873691-A | Cleaning formulation for removing residues on surfaces | 富士胶片电子材料美国有限公司 | 2016-08-17 | — | — | CN | claimed |
| US-20150267112-A1 | Etching Composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2015-09-24 | — | — | US | claimed |
| WO-2015142778-A1 | ETCHING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-09-24 | — | — | WO | claimed |
| WO-2015089023-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-06-18 | — | — | WO | claimed |
| WO-2015084921-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-06-11 | — | — | WO | claimed |
| US-20150159125-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2015-06-11 | — | — | US | claimed |
| US-20150159124-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2015-06-11 | — | — | US | claimed |
| WO-2015060954-A1 | CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-04-30 | — | — | WO | claimed |
| US-20150111804-A1 | CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2015-04-23 | — | — | US | claimed |