SCHEMBL24254871

SCHEMBL24254871

Cc1c(F)c(F)c(N(c2cc(-c3ccccc3)cc(N(c3c(F)c(F)c(C(F)(F)F)c(F)c3F)c3c(F)c(F)c(C(F)(F)F)c(F)c3F)c2)c2c(F)c(F)c(C(F)(F)F)c(F)c2F)c(F)c1F

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24254693 0.85 MEN1 (0.30)
SCHEMBL24254874 0.84
SCHEMBL25638904 0.83
SCHEMBL25638905 0.81 NOTUM (0.34)
SCHEMBL24254816 0.76 ALDH1A1 (0.33)
SCHEMBL24254730 0.76 KIF11 (0.33) KIF11
SCHEMBL24254825 0.76 KIF11 (0.36) KIF11
SCHEMBL24254833 0.74 KIF11 (0.32) KIF11
SCHEMBL25643779 0.74
SCHEMBL24254698 0.73 AKR1C2 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed