SCHEMBL24254698

SCHEMBL24254698

Fc1c(F)c(F)c(-c2c(F)c(F)c(N(c3cc(-c4ccccc4)cc(-c4ccccc4)c3)c3c(F)c(F)c(-c4c(F)c(F)c(F)c(F)c4F)c(F)c3F)c(F)c2F)c(F)c1F

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
AKR1C2 P52895 1/20 0.34
AKR1C1 Q04828 1/20 0.34
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24254797 0.86 MGLL (0.34)
SCHEMBL24254694 0.85 ALDH1A1 (0.35) ALDH1A1
SCHEMBL24254705 0.83
SCHEMBL25632772 0.81 ALDH1A1 (0.34) AKR1C2AKR1C1ALDH1A1
SCHEMBL24254796 0.80 RPS6KA3 (0.31)
SCHEMBL24254807 0.78 ALDH1A1 (0.38) ALDH1A1
SCHEMBL24254700 0.77 CNR2 (0.33)
SCHEMBL11926092 0.76 ALDH1A1 (0.50) AKR1C2AKR1C1ALDH1A1
SCHEMBL20100709 0.74 ALDH1A1 (0.39) ALDH1A1
SCHEMBL24254696 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed