SCHEMBL24254893

SCHEMBL24254893

Nc1ccc2c(c1)sc1cc(N)c(N)cc12

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.64
SMN1; SMN2 Q16637 5/20 0.64
ALDH1A1 P00352 5/20 0.64
RAB9A P51151 4/20 0.64
HPGD P15428 3/20 0.64
MMP12 P39900 1/20 0.38
KDM4E B2RXH2 4/20 0.35
GAA P10253 4/20 0.35
GLA P06280 3/20 0.35
NPC1 O15118 3/20 0.35
CA2 P00918 2/20 0.35
KEAP1 Q14145 1/20 0.34
CASP1 P29466 2/20 0.33
PKM P14618 2/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
CA1 P00915 1/20 0.33
CA4 P22748 1/20 0.33
LIMK1 P53667 1/20 0.33
TP53 P04637 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18965676 0.89 MAPT (0.72) MAPTSMN1; SMN2ALDH1A1RAB9AHPGD
SCHEMBL204571 0.89 MAPT (0.78) MAPTSMN1; SMN2ALDH1A1RAB9AHPGD
SCHEMBL30785527 0.89 MAPT (0.78) MAPTSMN1; SMN2ALDH1A1RAB9AHPGD
SCHEMBL30267589 0.89 MAPT (0.78) MAPTSMN1; SMN2ALDH1A1RAB9AHPGD
SCHEMBL24254901 0.87 MAPT (0.53) MAPTSMN1; SMN2ALDH1A1RAB9AHPGD
Hydrochloric Acid SCHEMBL7056525 0.86 MAPT (0.75) MAPTSMN1; SMN2ALDH1A1RAB9AHPGD
SCHEMBL31238914 0.84 MAPT (0.73) MAPTSMN1; SMN2ALDH1A1RAB9AHPGD
SCHEMBL3480951 0.84 MAPT (0.73) MAPTSMN1; SMN2ALDH1A1RAB9AHPGD
SCHEMBL3873558 0.83 PTK2 (0.41) MAPTSMN1; SMN2ALDH1A1RAB9AHPGD
SCHEMBL14174144 0.79 MAPT (0.92) MAPTSMN1; SMN2ALDH1A1RAB9AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed