SCHEMBL24254901

SCHEMBL24254901

Nc1ccc2sc3cc(N)c(N)cc3c2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.53
RAB9A P51151 5/20 0.53
SMN1; SMN2 Q16637 4/20 0.53
ALDH1A1 P00352 3/20 0.53
HPGD P15428 2/20 0.53
NOX4 Q9NPH5 2/20 0.37
NPC1 O15118 4/20 0.35
KDM4E B2RXH2 3/20 0.35
GFER P55789 2/20 0.35
GAA P10253 2/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
POLB P06746 1/20 0.35
NFKB1 P19838 1/20 0.35
NFKB2 Q00653 1/20 0.35
RELA Q04206 1/20 0.35
CASP1 P29466 1/20 0.33
GPR3 P46089 1/20 0.32
EGFR P00533 3/20 0.32
CA2 P00918 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30340804 0.89 MAPT (0.58) MAPTRAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL3887754 0.89 MAPT (0.58) MAPTRAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL24254893 0.87 MAPT (0.64) MAPTRAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL31238914 0.84 MAPT (0.73) MAPTRAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL3480951 0.84 MAPT (0.73) MAPTRAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL3873558 0.83 PTK2 (0.41) MAPTRAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL4850573 0.82 MAPT (0.58) MAPTRAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL3876429 0.78 ALDH1A1 (0.64) MAPTRAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL5110289 0.78 MAPT (0.77) MAPTRAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL29474205 0.78 MAPT (0.77) MAPTRAB9ASMN1; SMN2ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed