SCHEMBL24254894

SCHEMBL24254894

Nc1cc(N)c2oc3c(N)cccc3c2c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AHR P35869 1/20 0.42
ALDH1A1 P00352 4/20 0.41
HPGD P15428 4/20 0.41
CYP3A4 P08684 3/20 0.41
TSHR P16473 2/20 0.41
HSD17B10 Q99714 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
NPC1 O15118 4/20 0.37
RAB9A P51151 4/20 0.37
KMT2A Q03164 3/20 0.37
SMN1; SMN2 Q16637 3/20 0.37
KDM4E B2RXH2 3/20 0.37
MAPT P10636 3/20 0.37
MEN1 O00255 2/20 0.37
KEAP1 Q14145 1/20 0.35
PSMB8 P28062 1/20 0.35
NQO1 P15559 1/20 0.33
MAPK1 P28482 1/20 0.33
NR4A2 P43354 1/20 0.33
LCK P06239 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24254913 0.85 ALDH1A1 (0.55) AHRALDH1A1HPGDCYP3A4TSHR
SCHEMBL3878098 0.85 NPC1 (0.33) AHRALDH1A1HPGDTSHRNPC1
SCHEMBL3875246 0.78 KDM4E (0.58) AHRALDH1A1HPGDCYP3A4HSD17B10
SCHEMBL27919068 0.77 KMT2A (0.61) AHRALDH1A1HPGDCYP3A4TSHR
SCHEMBL23280737 0.73 ALDH1A1 (0.42) AHRALDH1A1HPGDCYP3A4TSHR
SCHEMBL27838764 0.73 ALDH1A1 (0.59) AHRALDH1A1HPGDCYP3A4TSHR
SCHEMBL30975195 0.73 ALDH1A1 (0.59) AHRALDH1A1HPGDCYP3A4TSHR
SCHEMBL23240707 0.72 ATP1A1 (0.47) ALDH1A1HPGDCYP3A4TSHRHSD17B10
SCHEMBL7748005 0.72 ALDH1A1 (0.65) ALDH1A1HPGDCYP3A4TSHRHSD17B10
SCHEMBL19670867 0.72 AHR (0.44) AHRALDH1A1HPGDCYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed