SCHEMBL24254913

SCHEMBL24254913

Nc1cccc2c1oc1c(N)cccc12

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.55
CYP3A4 P08684 4/20 0.55
TSHR P16473 3/20 0.55
HPGD P15428 3/20 0.55
HSD17B10 Q99714 2/20 0.55
TDP1 Q9NUW8 2/20 0.55
KEAP1 Q14145 1/20 0.46
PSMB8 P28062 1/20 0.43
NR4A2 P43354 1/20 0.42
AHR P35869 1/20 0.42
NPC1 O15118 1/20 0.41
RAB9A P51151 1/20 0.41
ALOX15 P16050 1/20 0.40
CASP1 P29466 1/20 0.40
CASP7 P55210 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
PIK3CA P42336 1/20 0.39
ELANE P08246 1/20 0.38
SLC11A2 P49281 1/20 0.38
KDM4E B2RXH2 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23280737 0.87 ALDH1A1 (0.42) ALDH1A1CYP3A4TSHRHPGDHSD17B10
SCHEMBL23240707 0.85 ATP1A1 (0.47) ALDH1A1CYP3A4TSHRHPGDHSD17B10
SCHEMBL24254894 0.85 AHR (0.42) ALDH1A1CYP3A4TSHRHPGDHSD17B10
SCHEMBL2342912 0.84 ALDH1A1 (0.48) ALDH1A1CYP3A4TSHRHPGDHSD17B10
SCHEMBL30606762 0.82 ALDH1A1 (0.52) ALDH1A1CYP3A4TSHRHPGDHSD17B10
SCHEMBL21896677 0.82 CYP3A4 (0.41) ALDH1A1CYP3A4TSHRHPGDHSD17B10
SCHEMBL15505761 0.82 ALDH1A1 (0.52) ALDH1A1CYP3A4TSHRHPGDHSD17B10
SCHEMBL28711824 0.82 TSHR (0.38) ALDH1A1CYP3A4TSHRHPGDHSD17B10
SCHEMBL20172329 0.79 ALDH1A1 (0.43) ALDH1A1CYP3A4TSHRHPGDHSD17B10
SCHEMBL30975195 0.77 ALDH1A1 (0.59) ALDH1A1CYP3A4TSHRHPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed