SCHEMBL242787

SCHEMBL242787

Oc1ccc2[nH]nnc2c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.48
KDM4E B2RXH2 1/20 0.48
HPGD P15428 1/20 0.48
ENPP2 Q13822 1/20 0.39
USP2 O75604 1/20 0.38
GAA P10253 1/20 0.38
ALOX15 P16050 1/20 0.38
RAD51 Q06609 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
PDGFRB P09619 2/20 0.37
FLT3 P36888 2/20 0.37
PLAU P00749 1/20 0.37
ABL1 P00519 1/20 0.37
KIT P10721 1/20 0.37
BCR P11274 1/20 0.37
HSP90AB1 P08238 2/20 0.36
PDPK1 O15530 1/20 0.36
SMAD3 P84022 1/20 0.36
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9171831 0.98 ALDH1A1 (0.47) ALDH1A1KDM4EHPGDENPP2USP2
Water SCHEMBL7451096 0.98 ALDH1A1 (0.47) ALDH1A1KDM4EHPGDENPP2USP2
SCHEMBL49848 0.83 PLAU (0.46) ALDH1A1KDM4EHPGDENPP2GAA
SCHEMBL13711446 0.80 MEN1 (0.42) ALDH1A1GAAMEN1KMT2ALMNA
SCHEMBL13711444 0.80 MEN1 (0.42) ALDH1A1GAAMEN1KMT2ALMNA
SCHEMBL31189943 0.77 ESR1 (0.50) ALDH1A1HPGDALOX15LMNAESR1
SCHEMBL19640293 0.77 CLK1 (0.34) PDE3BPDE3A
SCHEMBL23348984 0.76 CLK1 (0.37) PDPK1PDE3BPDE3A
SCHEMBL20978703 0.74 CLK1 (0.63) PDGFRBFLT3ABL1KITBCR
SCHEMBL7261306 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 375 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121574456-A High-impact-resistance polyethylene composite modified plastic 陕西聚能塑胶有限公司 2026-02-27 CN claimed
EP-3774680-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2025-09-24 EP claimed
CN-119504620-A Nitrite artificial hapten, and preparation method and application thereof 深圳农业与食品投资控股集团有限公司 2025-02-25 CN claimed
US-12187984-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2025-01-07 US claimed
US-12139693-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2024-11-12 US claimed
US-20240368505-A1 FLUORINE-FREE CLEANING AGENT, PREPARATION METHOD THEREFOR AND USE THEREOF Tan Kah Kee Innovation Laboratory (CN) 2024-11-07 US claimed
CN-118652669-A Fuel cell cooling liquid and preparation method thereof 中国船舶集团有限公司第七一八研究所 2024-09-17 CN claimed
EP-3672944-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2024-08-07 EP claimed
CN-118272797-A Environment-friendly passivation solution for antioxidant and corrosion-resistant copper foil, preparation and application thereof, and passivation method for copper foil 江西理工大学 2024-07-02 CN claimed
CN-118256157-A Chemical mechanical polishing solution and application thereof 安集微电子科技(上海)股份有限公司 2024-06-28 CN claimed
US-20150159125-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-06-11 US claimed
US-20150159124-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-06-11 US claimed
WO-2015060954-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-04-30 WO claimed
CN-104562039-A Novel corrosion inhibitor composition and preparation method thereof CHINA PETROLEUM & CHEMICAL 2015-04-29 CN claimed
US-20150111804-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-04-23 US claimed
CN-104185386-A Etching process for multilayer circuit board with fine lines SICHUAN HAIYING ELECTRONIC TECHNOLOGY CO LTD 2014-12-03 CN claimed
CN-100543124-C Substrate is with clean-out system and purging method WAKO PURE CHEM IND LTD (JP) 2009-09-23 CN claimed
CN-100471361-C Method for opening window on polyimide base material of flexible printed circuit board and its etching fluid UNIV ELECTRONIC SCIENCE & TECH (CN) 2009-03-18 CN claimed
CN-1953643-A Method for opening window on polyimide base material of flexible printed circuit board and its etching fluid UNIV ELECTRONIC SCIENCE & TECH (CN) 2007-04-25 CN claimed
WO-1997027360-A1 PHASE SEPARATION APPARATUS SCAPA GROUP PLC (GB) 1997-07-31 WO claimed