Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDPS | P14324 | 2/20 | 0.41 |
| ▸ | ANPEP | P15144 | 4/20 | 0.35 |
| ▸ | LAP3 | P28838 | 3/20 | 0.35 |
| ▸ | ERAP1 | Q9NZ08 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3615575 | 0.76 | FDPS (0.43) | FDPSANPEPLAP3ERAP1 | |
| SCHEMBL10634337 | 0.76 | ALDH1A1 (0.43) | FDPSANPEPLAP3ERAP1 | |
| SCHEMBL2468885 | 0.76 | FDPS (0.45) | FDPSANPEPLAP3ERAP1 | |
| SCHEMBL8644881 | 0.75 | FDPS (0.43) | FDPSLAP3 | |
| SCHEMBL8611952 | 0.74 | FDPS (0.37) | FDPSANPEPLAP3ERAP1 | |
| SCHEMBL15409829 | 0.74 | FDPS (0.37) | FDPS | |
| SCHEMBL15409669 | 0.74 | FDPS (0.37) | FDPS | |
| SCHEMBL10706079 | 0.74 | FDPS (0.38) | FDPS | |
| SCHEMBL7897812 | 0.72 | FDPS (0.42) | FDPS | |
| SCHEMBL4906845 | 0.72 | FDPS (0.42) | FDPS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230365893-A1 | COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-16 | — | — | US | claimed |
| US-20230238251-A1 | ETCHING LIQUID FOR TITANIUM AND/OR TITANIUM ALLOY, METHOD FOR ETCHING TITANIUM AND/OR TITANIUM ALLOY WITH USE OF SAID ETCHING LIQUID, AND METHOD FOR PRODUCING SUBSTRATE WITH USE OF SAID ETCHING LIQUID | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-07-27 | — | — | US | claimed |
| EP-4207250-A1 | COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-07-05 | — | — | EP | claimed |
| US-10570522-B2 | Etching solution for copper or copper alloy | ENTEGRIS, INC. (US) | 2020-02-25 | — | — | US | claimed |
| EP-2927937-B1 | CLEANING LIQUID FOR SEMICONDUCTOR ELEMENTS AND CLEANING METHOD USING SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-01-03 | — | — | EP | claimed |
| US-9790600-B2 | Etching agent for copper or copper alloy | ENTEGRIS, INC. (US) | 2017-10-17 | — | — | US | claimed |
| US-20160053383-A1 | ETCHING AGENT FOR COPPER OR COPPER ALLOY | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-02-25 | — | — | US | claimed |
| US-9175404-B2 | Etching agent for copper or copper alloy | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-11-03 | — | — | US | claimed |
| EP-1679361-B1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | WAKO PURE CHEM IND LTD (JP) | 2015-06-24 | — | — | EP | claimed |
| US-8900371-B2 | Cleaning agent for substrate and cleaning method | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-02 | — | — | US | claimed |
| US-8614175-B2 | Cleaning solution composition for a solar cell | DONGWOO FINE-CHEM CO., LTD. (KR) | 2013-12-24 | — | — | US | claimed |
| US-20130270217-A1 | ETCHING SOLUTION FOR COPPER OR COPPER ALLOY | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-10-17 | — | — | US | claimed |
| US-20120090670-A1 | CLEANING SOLUTION COMPOSITION FOR A SOLAR CELL | DONGWOO FINE-CHEM CO., LTD. (KR) | 2012-04-19 | — | — | US | claimed |
| US-20070235061-A1 | Cleaning Agent for Substrate and Cleaning Method | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2007-10-11 | — | — | US | claimed |
| EP-1679361-A1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-12 | — | — | EP | claimed |
| US-6495096-B1 | DEODORANT FOR SUBSTANCES CONTAINING AT LEAST ONE OF HYDROGEN SULFIDE AND MERCAPTANS WHICH COMPRISES COMBINATION OF PEROXIDE, CHELATING AGENT AND NITRATE ION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-12-17 | — | — | US | claimed |
| EP-0560324-B1 | Cleaning fluid for semiconductor substrate | MITSUBISHI GAS CHEMICAL CO (JP) | 1998-08-19 | — | — | EP | claimed |
| US-5705089-A | HYDROGEN PEROXIDE, PHOSPHONIC ACID CHELATEING AGENT, WETTING AGENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-01-06 | — | — | US | claimed |
| EP-0528053-B1 | CLEANING LIQUID FOR SEMICONDUCTOR SUBSTRATE | MITSUBISHI GAS CHEMICAL CO (JP) | 1996-01-03 | — | — | EP | claimed |
| EP-0560324-A1 | Cleaning fluid for semiconductor substrate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1993-09-15 | — | — | EP | claimed |