SCHEMBL3615575

SCHEMBL3615575

CC(CN)N(C(P(=O)(O)O)P(=O)(O)O)C(P(=O)(O)O)P(=O)(O)O

nearest known ligand 0.43

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
FDPS P14324 2/20 0.43
ANPEP P15144 5/20 0.41
LAP3 P28838 4/20 0.41
ERAP1 Q9NZ08 1/20 0.41
ERAP2 Q6P179 1/20 0.41
GABBR2 O75899 3/20 0.38
GABBR1 Q9UBS5 3/20 0.38
GABRR1 P24046 1/20 0.35
ALDH1A1 P00352 3/20 0.34
TDP1 Q9NUW8 1/20 0.34
METAP1 P53582 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL242873 0.76 FDPS (0.41) FDPSANPEPLAP3ERAP1
SCHEMBL5407964 0.72 FDPS (0.46) FDPSANPEPLAP3ERAP1ALDH1A1
SCHEMBL61410 0.71 FDPS (0.48) FDPSANPEPLAP3ERAP1ERAP2
SCHEMBL11589305 0.70 FDPS (0.44) FDPSANPEPLAP3ERAP1ALDH1A1
Ammonia Solution, Strong SCHEMBL7596444 0.68 FDPS (0.46) FDPSANPEPLAP3ERAP1ERAP2
Ammonia Solution, Strong SCHEMBL10538038 0.68 FDPS (0.46) FDPSANPEPLAP3ERAP1ERAP2
Ammonia Solution, Strong SCHEMBL10863732 0.68 FDPS (0.46) FDPSANPEPLAP3ERAP1ERAP2
SCHEMBL8620092 0.68 ANPEP (0.41) FDPSANPEPLAP3ERAP1ERAP2
SCHEMBL182938 0.67
SCHEMBL11207916 0.67 FDPS (0.52) FDPSANPEPLAP3ERAP1METAP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1679361-B1 CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD WAKO PURE CHEM IND LTD (JP) 2015-06-24 EP claimed
US-8900371-B2 Cleaning agent for substrate and cleaning method WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2014-12-02 US claimed
US-20070235061-A1 Cleaning Agent for Substrate and Cleaning Method WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2007-10-11 US claimed
EP-1865049-B1 CLEANING AGENT FOR THERMOSTATIC CHAMBERS WAKO PURE CHEM IND LTD (JP) 2014-08-06 EP disclosed
US-7727949-B2 Cleaning agent for thermostatic chambers WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-06-01 US disclosed
US-20080214420-A1 Cleaning Agent for Thermostatic Chambers FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2008-09-04 US disclosed
EP-1865049-A1 CLEANING AGENT FOR THERMOSTATIC CHAMBERS Wako Pure Chemical Industries, Ltd. (JP) 2007-12-12 EP disclosed