SCHEMBL242968

SCHEMBL242968

Oc1cccc(C(O)(c2ccccc2)c2ccccc2)c1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.50
HSD17B10 Q99714 4/20 0.50
HIF1A Q16665 2/20 0.50
CYP2D6 P10635 2/20 0.50
CYP1A2 P05177 1/20 0.50
CYP2C9 P11712 1/20 0.50
CYP2C19 P33261 1/20 0.50
ALDH1A1 P00352 5/20 0.44
TDP1 Q9NUW8 3/20 0.44
CA2 P00918 3/20 0.44
LMNA P02545 3/20 0.44
ALOX15 P16050 3/20 0.44
EGFR P00533 2/20 0.44
FYN P06241 2/20 0.44
MMP9 P14780 2/20 0.44
RECQL P46063 2/20 0.44
MMP2 P08253 2/20 0.44
ADAMTS4 O75173 1/20 0.44
CA1 P00915 1/20 0.44
MMP8 P22894 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2241764 0.85 ALDH1A1 (0.50) HPGDHSD17B10HIF1ACYP2D6CYP1A2
SCHEMBL30445305 0.85 ALDH1A1 (0.50) HPGDHSD17B10HIF1ACYP2D6CYP1A2
SCHEMBL7160137 0.83 CYP2D6 (0.55) HPGDHSD17B10HIF1ACYP2D6CYP1A2
SCHEMBL3830734 0.83 ALDH1A1 (0.44) HPGDHSD17B10HIF1ACYP2D6CYP1A2
SCHEMBL9475826 0.82 ALDH1A1 (0.42) HPGDHSD17B10HIF1ACYP2D6CYP1A2
SCHEMBL9973585 0.81 ALDH1A1 (0.46) HPGDHSD17B10HIF1ACYP2D6CYP1A2
SCHEMBL30536501 0.81 ALDH1A1 (0.46) HPGDHSD17B10HIF1ACYP2D6CYP1A2
SCHEMBL11131095 0.81 ALDH1A1 (0.46) HPGDHSD17B10HIF1ACYP2D6CYP1A2
SCHEMBL3478281 0.81 ALDH1A1 (0.46) HPGDHSD17B10HIF1ACYP2D6CYP1A2
Ethane SCHEMBL28162165 0.81 ALDH1A1 (0.52) HPGDHSD17B10HIF1ACYP2D6CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 164 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108291122-B Anionically curable compositions 设计分子有限公司 2021-01-05 CN claimed
CN-106378087-A Preparation method of nano composite adsorbing material as well as adsorbent and treatment method used for treating trihydroxy triphenylmethane substance in wastewater 重庆大学 2017-02-08 CN claimed
CN-103097427-A Liquid curable epoxy resin composition and adhesive agent containing same NIPPON SODA CO 2013-05-08 CN claimed
CN-101762972-B Infrared positive thermal-sensitive imaging composition CHENGDU XINGRAPHICS CO LTD 2012-12-26 CN claimed
CN-100384934-C Epoxy resin compsn. and its application MITSUI CHEMICALS INC (JP) 2008-04-30 CN claimed
CN-1539879-A Epoxy resin compsn. and its application ������ѧ��ʽ���� 2004-10-27 CN claimed
CN-115362193-B Epoxy resin and electrodeposition paint 关西涂料株式会社 2024-11-08 CN disclosed
CN-114222779-B Polyorganosiloxane containing epoxy group, curable resin composition containing the same, and cured product thereof 三菱化学株式会社 2024-06-18 CN disclosed
CN-118103424-A Modified epoxy resin and electrodeposition paint 关西涂料株式会社 2024-05-28 CN disclosed
EP-4334252-A2 SPIN ON METAL-ORGANIC FORMULATIONS Merck Patent GmbH (DE) 2024-03-13 EP disclosed
WO-2022233919-A2 SPIN ON METAL-ORGANIC FORMULATIONS MERCK PATENT GMBH (DE) 2022-11-10 WO disclosed
WO-2022160357-A1 MONOMER FOR POLYMER GEL, POLYMER GEL AND PREPARATION METHOD THEREFOR 苏州大学 2022-08-04 WO disclosed
WO-2022160356-A1 POROUS CROSSLINKED MATERIAL, PREPARATION METHOD FOR SAME, AND APPLICATIONS THEREOF 苏州大学 2022-08-04 WO disclosed
EP-0906941-A1 WEATHER-RESISTANT RESIN COMPOSITION FOR POWDER COATING NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) 1999-04-07 EP disclosed
EP-0703277-A2 Polyepoxide resins incorporating epoxy terminated urethanes as tougheners AIR PRODUCTS AND CHEMICALS, INC. (US) 1996-03-27 EP disclosed
US-5480958-A Polyepoxide resins incorporating epoxy terminated urethanes as tougheners AIR PRODUCTS AND CHEMICALS, INC. (US) 1996-01-02 US disclosed
US-5478682-A Patterned exposure and alkaline development of a photosensitive resin covering a film aligned in one direction prior to aligning uncovered film portion in another direction JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-12-26 US disclosed
US-5384228-A Novolak resins with quinone diazide sulfonic esters and condensation polymers of phenol with hydroxybenzaldehyde and aromatic compounds TOKYO OHKA KOGYO CO., LTD. (JP) 1995-01-24 US disclosed
EP-0125454-B1 A PROCESS FOR REDUCING THE HYDROLYZABLE CHLORIDE CONTENT OF AN EPOXIDATION PRODUCT THE DOW CHEMICAL COMPANY (US) 1988-02-10 EP disclosed
US-3789053-A OXAZOLIDINONE MODIFIED TRIGLYCIDYL ETHER OF TRIHYDROXY TRIPHENYL METHANE AND DERIVATIVES THEREOF DOW CHEMICAL CO 1974-01-29 US disclosed