SCHEMBL7160137

SCHEMBL7160137

Oc1ccc(C(O)(c2ccccc2)c2ccccc2)c(O)c1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 2/20 0.55
CYP1A2 P05177 2/20 0.55
CYP2C9 P11712 2/20 0.55
HPGD P15428 2/20 0.55
CYP2C19 P33261 2/20 0.55
HSD17B10 Q99714 2/20 0.55
HIF1A Q16665 1/20 0.55
CRHBP P24387 1/20 0.40
CRHR2 Q13324 1/20 0.40
CYP3A4 P08684 2/20 0.38
ESR1 P03372 3/20 0.36
ESR2 Q92731 3/20 0.36
PTPN22 Q9Y2R2 1/20 0.34
SELL P14151 1/20 0.34
SELP P16109 1/20 0.34
CYP19A1 P11511 2/20 0.33
ALDH1A1 P00352 2/20 0.33
CFTR P13569 1/20 0.33
GOPC Q9HD26 1/20 0.33
POLB P06746 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL242968 0.83 HPGD (0.50) CYP2D6CYP1A2CYP2C9HPGDCYP2C19
SCHEMBL9811614 0.82 CYP2D6 (0.44) CYP2D6CYP1A2CYP2C9HPGDCYP2C19
SCHEMBL23861353 0.81 HPGD (0.39) CYP2D6CYP1A2CYP2C9HPGDCYP2C19
SCHEMBL14580918 0.78 CYP2D6 (0.53) CYP2D6CYP1A2CYP2C9HPGDCYP2C19
SCHEMBL23861352 0.78 ESR1 (0.52) CYP2D6CYP1A2CYP2C9HPGDCYP2C19
SCHEMBL1001138 0.78 ESR1 (0.52) CYP2D6CYP1A2CYP2C9HPGDCYP2C19
SCHEMBL2241764 0.76 ALDH1A1 (0.50) CYP2D6CYP1A2CYP2C9HPGDCYP2C19
SCHEMBL30445305 0.76 ALDH1A1 (0.50) CYP2D6CYP1A2CYP2C9HPGDCYP2C19
SCHEMBL3850570 0.76 CYP1A2 (0.46) CYP2D6CYP1A2CYP2C9HPGDCYP2C19
SCHEMBL11591149 0.74 CRHBP (0.53) CYP2D6CYP1A2CYP2C9HPGDCYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1210613-C Photosensitive lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 2005-07-13 CN disclosed
US-6653043-B1 Mixtures of photoresists, sensitizers and active materials such as silica sol modified by resorcin coupled to silanes, used to improve sensitivity and resolution KANSAI RESEARCH INSTITUTE, INC. (JP) 2003-11-25 US disclosed
US-6534235-B1 Photosensitive resin and inorganic particles having a functional group obtained by a reaction between inorganic particles and a coupling agent KANSAI RESEARCH INSTITUTE, INC. (JP) 2003-03-18 US disclosed
US-6440632-B2 FORMING PATTERN; EXPOSURE TO LIGHT KANSAI RESEARCH INSTITUTE (JP) 2002-08-27 US disclosed
US-20020012867-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING THE SAME KRI, INC. (JP) 2002-01-31 US disclosed
EP-1096313-A1 Active particle, photosensitive resin composition, and process for forming pattern Kansai Research Institute, Inc. (JP) 2001-05-02 EP disclosed
CN-1292508-A Photosensitive lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 2001-04-25 CN disclosed
EP-0962825-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING THE SAME Kansai Research Institute (KRI) (JP) 1999-12-08 EP disclosed