SCHEMBL243118

SCHEMBL243118

Cc1cc(C)c(C(=O)c2ccccc2)c(C)c1N

nearest known ligand 0.51

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.51
MAPT P10636 3/20 0.51
LMNA P02545 1/20 0.51
GRM6 O15303 1/20 0.47
PBRM1 Q86U86 1/20 0.46
ATM Q13315 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
KDM4E B2RXH2 3/20 0.43
CHRM4 P08173 3/20 0.43
PTK2B Q14289 1/20 0.43
GAA P10253 1/20 0.43
BCL2L1 Q07817 1/20 0.42
HTT P42858 1/20 0.41
POLB P06746 1/20 0.41
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29378123 0.81 AKR1C3 (0.48) ALDH1A1MAPTLMNAGRM6ATM
SCHEMBL15552435 0.81 AKR1C3 (0.48) ALDH1A1MAPTLMNAGRM6ATM
SCHEMBL27585830 0.81 MAPT (0.50) ALDH1A1MAPTLMNAPBRM1KDM4E
SCHEMBL18155901 0.80 LMNA (0.47) ALDH1A1MAPTLMNAGRM6ATM
SCHEMBL6390145 0.79 ALDH1A1 (0.56) ALDH1A1MAPTLMNAPBRM1ATM
SCHEMBL8309614 0.79 KDM4E (0.48) ALDH1A1MAPTTDP1L3MBTL1KDM4E
SCHEMBL98045 0.79 ALDH1A1 (0.45) ALDH1A1MAPTLMNAGRM6PBRM1
SCHEMBL8067279 0.79 ALDH1A1 (0.45) ALDH1A1MAPTLMNAGRM6ATM
SCHEMBL16926375 0.79 ALDH1A1 (0.45) ALDH1A1MAPTLMNAGRM6PBRM1
SCHEMBL377001 0.78 MAPT (0.54) ALDH1A1MAPTLMNAGRM6PBRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 290 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9733563-B2 Photosensitive resin composition and photosensitive material comprising the same LG CHEM, LTD. (KR) 2017-08-15 US claimed
US-8399176-B2 Photosensitive resin composition LG CHEM, LTD. (KR) 2013-03-19 US claimed
US-20100216073-A1 PHOTOSENSITIVE RESIN COMPOSITION LG CHEM, LTD. (KR) 2010-08-26 US claimed
US-12607932-B2 Photosensitive composition and film prepared from the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2026-04-21 US disclosed
US-12516211-B2 Ink composition and electronic device including film formed using the ink composition SAMSUNG DISPLAY CO., LTD. (KR) 2026-01-06 US disclosed
US-20250333579-A1 COMPOSITION AND PACKAGE STRUCTURE INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2025-10-30 US disclosed
US-12441840-B2 Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same LG CHEM, LTD. (KR) 2025-10-14 US disclosed
EP-3678203-B1 METHOD FOR PREPARING ORGANIC ELECTRONIC DEVICE LG CHEMICAL LTD (KR) 2025-06-18 EP disclosed
CN-120059635-A Double faced adhesive tape and multilayer structure 财团法人工业技术研究院 2025-05-30 CN disclosed
US-20250171664-A1 DOUBLE-SIDED ADHESIVE AND MULTILAYER STRUCTURE INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2025-05-29 US disclosed
US-12202997-B2 Encapsulating composition LG CHEM, LTD. (KR) 2025-01-21 US disclosed
WO-2008102990-A1 PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX LG CHEM, LTD. (KR) 2008-08-28 WO disclosed
WO-2008097065-A1 ALKALI-DEVELOPABLE RESINS, METHOD FOR PREPARING THE SAME AND PHOTOSENSITIVE COMPOSITION COMPRISING THE ALKALI-DEVELOPABLE RESINS LG CHEM, LTD. (KR) 2008-08-14 WO disclosed
WO-2008078953-A1 BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME LG CHEM, LTD. (KR) 2008-07-03 WO disclosed
US-7328988-B2 Ink composition for inkjet spacer formation and spacer element using the same LG CHEM, LTD. (KR) 2008-02-12 US disclosed
US-20070190429-A1 COMPOSITION FOR INKJET SPACER FORMATION AND SPACER ELEMENT USING THE SAME LG CHEM, LTD. (KR) 2007-08-16 US disclosed
US-20060258774-A1 Pixel-to-barrier-uneveness-controllable ink LG CHEM, LTD. (KR) 2006-11-16 US disclosed
WO-2006098575-A1 PIXEL-TO-BARRIER-UNEVENESS-CONTROLLABLE INK LG CHEM, LTD. (KR) 2006-09-21 WO disclosed
US-20040257416-A1 Ink composition for inkjet spacer fomation and spacer element using the same LG CHEM, LTD. (KR) 2004-12-23 US disclosed
WO-2004065502-A1 INK COMPOSITION FOR INKJET SPACER FORMATION AND SPACER ELEMENT USING THE SAME LG CHEM, LTD. (KR) 2004-08-05 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12607932-B2 Photosensitive composition and film prepared from the same SETD2, SETD1B, DDT ALDH1A1 1387/4885MAPT 412/4885LMNA 2403/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.