SCHEMBL243465

SCHEMBL243465

CCCCCCCC(=O)c1cc(-c2ccccc2)cs1

nearest known ligand 0.49

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HDAC6 Q9UBN7 1/20 0.49
PLA2G4A P47712 1/20 0.45
CES1 P23141 3/20 0.44
CES2 O00748 1/20 0.44
MEN1 O00255 1/20 0.44
ALDH1A1 P00352 1/20 0.44
MAPT P10636 1/20 0.44
HTT P42858 1/20 0.44
KMT2A Q03164 1/20 0.44
ATM Q13315 1/20 0.44
SOAT1 P35610 2/20 0.44
CA2 P00918 1/20 0.44
POLB P06746 1/20 0.44
FAAH O00519 3/20 0.43
HPGD P15428 3/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
MMP12 P39900 1/20 0.42
HSD17B3 P37058 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL242998 0.88 SMN1; SMN2 (0.56) HDAC6CES1CES2MAPTHPGD
SCHEMBL27989462 0.84 HDAC6 (0.45) HDAC6PLA2G4ACES1CES2SOAT1
SCHEMBL27688659 0.82 HDAC6 (0.57) HDAC6MEN1ALDH1A1MAPTKMT2A
SCHEMBL23300707 0.80 HDAC6 (0.55) HDAC6MEN1ALDH1A1KMT2APOLB
SCHEMBL16279118 0.77 MMP12 (0.39) HDAC6CES1CES2SOAT1POLB
SCHEMBL28818330 0.77 SMN1; SMN2 (0.42) HDAC6CES1CES2HTTCA2
Benzoic Acid SCHEMBL28702141 0.77 CES2 (0.43) HDAC6CES1CES2MEN1ALDH1A1
SCHEMBL23330848 0.77 HDAC6 (0.49) HDAC6MEN1ALDH1A1KMT2APOLB
SCHEMBL1594539 0.76 MMP12 (0.42) HDAC6CES1CES2MEN1ALDH1A1
SCHEMBL1736236 0.76 ALDH1A1 (0.42) HDAC6CES1CES2ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115698853-A Photosensitive resin composition, and photosensitive resin film and color filter produced using same 三星SDI株式会社 2023-02-03 CN disclosed
CN-115637058-A Core-shell compound, resin composition and layer thereof, color filter and display device 三星SDI株式会社 2023-01-24 CN disclosed
CN-115572492-A Core-shell compound, photosensitive resin composition, photosensitive resin layer, color filter, and CMOS image sensor 三星SDI株式会社 2023-01-06 CN disclosed
CN-111183193-B Composition containing quantum dots, method for manufacturing quantum dots and pixels, and color filter 三星SDI株式会社 2022-12-20 CN disclosed
CN-110244511-B Photosensitive resin composition and layer thereof, adhesive composition and adhesive film thereof, color filter, polarizing plate and optical display device 三星SDI株式会社 2022-11-22 CN disclosed
CN-115236935-A Photosensitive resin composition and layer thereof, adhesive composition and adhesive film thereof, color filter, polarizing plate and optical display device 三星SDI株式会社 2022-10-25 CN disclosed
CN-115202151-A Photosensitive resin composition and layer thereof, adhesive composition and adhesive film thereof, color filter, polarizing plate and optical display device 三星SDI株式会社 2022-10-18 CN disclosed
CN-108732867-B Photosensitive resin composition, photosensitive resin layer using same, and color filter 三星SDI株式会社 2022-06-14 CN disclosed
CN-107522704-B Novel compound, photosensitive resin composition containing same and color filter 三星SDI株式会社 2022-06-07 CN disclosed
CN-108475018-B Photosensitive resin composition, black columnar spacer using same, and color filter 三星SDI株式会社 2022-04-15 CN disclosed
CN-106588938-B Compound, photosensitive resin composition comprising same and color filter 三星SDI株式会社 2019-12-17 CN disclosed
US-9223206-B2 Photosensitive resin composition and applications of the same CHI MEI CORPORATION (TW) 2015-12-29 US disclosed
US-9063422-B2 Photosensitive resin composition and application of the same CHI MEI CORPORATION (TW) 2015-06-23 US disclosed
US-9063412-B2 Photosensitive resin composition and application of the same CHI MEI CORPORATION (TW) 2015-06-23 US disclosed
US-9029051-B2 Photosensitive resin composition, color filter and liquid crystal display device CHI MEI CORPORATION (TW) 2015-05-12 US disclosed
US-20130277627-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATIONS OF THE SAME CHI MEI CORPORATION (TW) 2013-10-24 US disclosed
US-20130244177-A1 PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2013-09-19 US disclosed
US-20130228727-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME CHI MEI CORPORATION (TW) 2013-09-05 US disclosed
US-20130135763-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME CHI MEI CORPORATION (TW) 2013-05-30 US disclosed
US-20120002138-A1 Pattern forming ink composition, light guide plate, light emitting unit and liquid crystal display element having the light emitting unit CHI-MEI CORPORATION 2012-01-05 US disclosed