SCHEMBL24361808

SCHEMBL24361808

CC(C)(C)C(=O)OC1C2CC3C1OC(=O)C3C2C(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24361821 0.82 — —
SCHEMBL10262727 0.81 ALDH1A1 (0.31) —
SCHEMBL22503115 0.80 CA1 (0.32) —
SCHEMBL19019484 0.80 — —
SCHEMBL12997474 0.77 ALDH1A1 (0.30) —
SCHEMBL19901526 0.77 — —
SCHEMBL26059440 0.76 — —
SCHEMBL21504660 0.75 — —
SCHEMBL26445968 0.75 — —
SCHEMBL12604984 0.75 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-04-28 — — US disclosed
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