Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | AR | P10275 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4460953 | 0.95 | KDM4E (0.36) | ALDH1A1MAPK1HSD17B10KDM4ECYP3A4 | |
| SCHEMBL3630820 | 0.91 | KDM4E (0.46) | ALDH1A1MAPK1HSD17B10KDM4ECYP3A4 | |
| SCHEMBL8402344 | 0.86 | — | — | |
| SCHEMBL15710099 | 0.85 | — | — | |
| SCHEMBL25669 | 0.85 | ALDH1A1 (0.36) | ALDH1A1MAPK1HSD17B10KDM4ECYP3A4 | |
| SCHEMBL1958091 | 0.85 | — | — | |
| SCHEMBL94908 | 0.78 | ALDH1A1 (0.33) | ALDH1A1MAPK1HSD17B10KDM4ECYP3A4 | |
| SCHEMBL6063006 | 0.75 | THRB (0.30) | — | |
| SCHEMBL11147679 | 0.75 | — | — | |
| SCHEMBL9720867 | 0.75 | KDM4E (0.39) | ALDH1A1MAPK1HSD17B10KDM4ECYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | claimed |
| US-20150024326-A1 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | KAYAKU ADVANCED MATERIALS, INC. | 2015-01-22 | — | — | US | claimed |
| US-8313571-B2 | Compositions and processes for manufacturing printed electronics | MICROCHEM CORP. (US) | 2012-11-20 | — | — | US | claimed |
| US-8313173-B2 | Compositions and processes for manufacturing printed electronics | MICROCHEM CORP. (US) | 2012-11-20 | — | — | US | claimed |
| EP-0232973-B1 | MICROPLASTIC STRUCTURES, PROCESS FOR FORMING SUCH STRUCTURES, AND PHOTOMASK SUITABLE FOR USE IN SUCH PROCESS | ROHM AND HAAS COMPANY (US) | 1993-06-09 | — | — | EP | claimed |
| EP-0232973-A2 | Microplastic structures, process for forming such structures, and photomask suitable for use in such process | ROHM AND HAAS COMPANY (US) | 1987-08-19 | — | — | EP | claimed |
| CN-87100180-A | Micro plastic structure and manufacturing method thereof | — | 1987-08-19 | — | — | CN | claimed |
| EP-4644354-A1 | POLYMER MECHANORADICAL INITIATOR AND REACTION METHOD USING POLYMER MECHANORADICAL INITIATOR | National University Corporation Hokkaido University (JP) | 2025-11-05 | — | — | EP | disclosed |
| US-12189291-B2 | Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2025-01-07 | — | — | US | disclosed |
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | disclosed |
| US-11536036-B2 | Floor tile including fabric material and manufacturing method thereof | NOX CORPORATION | 2022-12-27 | — | — | US | disclosed |
| EP-3388595-B1 | FLOOR TILE INCLUDING FABRIC MATERIAL AND MANUFACTURING METHOD THEREFOR | NOX CORP (KR) | 2021-06-30 | — | — | EP | disclosed |
| US-20200377713-A1 | POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2020-12-03 | — | — | US | disclosed |
| EP-0374812-B1 | PROCESS FOR THE PREPARATION OF EXPANDABLE STYRENE POLYMERS | BASF Aktiengesellschaft (DE) | 1992-01-22 | — | — | EP | disclosed |
| US-5077444-A | Injecting ammonia into dryer system to prevent coloring | ETHYL CORPORATION (US) | 1991-12-31 | — | — | US | disclosed |
| CN-1045985-A | Fire-retardant combination | SHELL INT RESEARCH (NL) | 1990-10-10 | — | — | CN | disclosed |
| EP-0374812-A1 | Process for the preparation of expandable styrene polymers | BASF Aktiengesellschaft (DE) | 1990-06-27 | — | — | EP | disclosed |
| US-4812484-A | HEATING AQUEOUS DISPERSION, IMPREGNATION WITH BLOWING AGENT, DEPRESSURIZATION | MITSUBISHI YUKA BADISCHE CO., LTD. (JP) | 1989-03-14 | — | — | US | disclosed |
| EP-0232973-A2 | Microplastic structures, process for forming such structures, and photomask suitable for use in such process | ROHM AND HAAS COMPANY (US) | 1987-08-19 | — | — | EP | disclosed |
| CN-87100180-A | Micro plastic structure and manufacturing method thereof | — | 1987-08-19 | — | — | CN | disclosed |