SCHEMBL24859820

SCHEMBL24859820

CCC(O)(CC)c1cc(OC(=O)C(C)(CC(C)(C)C)C(C)(C)C)cc(C(O)(CC)CC)c1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21943829 0.87 ELANE (0.33) ELANE
SCHEMBL18030078 0.82 LMNA (0.35) —
SCHEMBL14477140 0.75 ESR1 (0.36) ELANE
SCHEMBL21973904 0.73 ELANE (0.47) ELANE
SCHEMBL24859815 0.73 ELANE (0.35) ELANE
SCHEMBL12058674 0.72 ELANE (0.51) ELANE
SCHEMBL10250059 0.72 ELANE (0.46) ELANE
SCHEMBL21776384 0.72 NR1H3 (0.39) —
SCHEMBL24405082 0.71 — —
SCHEMBL25068947 0.71 ELANE (0.45) ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11548844-B2 Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-10 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11548844-B2 Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process PARG, PCNA, PLK2 ELANE 3015/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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