Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.42 |
| ▸ | CASP1 | P29466 | 2/20 | 0.42 |
| ▸ | RECQL | P46063 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | MAOB | P27338 | 1/20 | 0.35 |
| ▸ | MAOA | P21397 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28568707 | 0.83 | MAPK1 (0.54) | MAPK1TSHRCYP3A4CASP1RECQL | |
| SCHEMBL29472201 | 0.80 | ALDH1A1 (0.57) | MAPK1TSHRCYP3A4CASP1RECQL | |
| SCHEMBL28330942 | 0.80 | ALDH1A1 (0.57) | MAPK1TSHRCYP3A4CASP1RECQL | |
| SCHEMBL29403060 | 0.76 | MAPK1 (0.60) | MAPK1TSHRCYP3A4CASP1RECQL | |
| SCHEMBL31476400 | 0.76 | TSHR (0.60) | MAPK1TSHRCYP3A4CASP1RECQL | |
| SCHEMBL29374282 | 0.76 | TSHR (0.60) | MAPK1TSHRCYP3A4CASP1RECQL | |
| SCHEMBL111419 | 0.76 | MAPK1 (0.60) | MAPK1TSHRCYP3A4CASP1RECQL | |
| SCHEMBL125232 | 0.76 | TSHR (0.60) | MAPK1TSHRCYP3A4CASP1RECQL | |
| SCHEMBL15735429 | 0.76 | KCNN4 (0.43) | MAPK1ALDH1A1TP53ALOX15POLB | |
| SCHEMBL15736194 | 0.76 | TSHR (0.45) | MAPK1TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0330456-B1 | Preparation of silicon-containing polyimide precursor and cured polyimides obtained therefrom | CHISSO CORP (JP) | 1994-09-07 | — | — | EP | claimed |
| EP-2128193-B1 | POROUS POLYIMIDE | IBIDEN CO LTD (JP) | 2013-06-19 | — | — | EP | disclosed |
| US-8022110-B2 | Porous polyimide | IBIDEN CO., LTD. (JP) | 2011-09-20 | — | — | US | disclosed |
| US-7771521-B2 | Hyperbranched polyimide-based hybrid material | NATIONAL UNIVERSITY CORPORATION NAGOYA INSTITUTE OF TECHNOLOGY (JP) | 2010-08-10 | — | — | US | disclosed |
| EP-1792928-B1 | MULTIBRANCHED POLYIMIDE HYBRID MATERIAL | NAT UNIV CORP NAGOYA INST TECH (JP) | 2010-03-10 | — | — | EP | disclosed |
| US-20100048745-A1 | POROUS POLYIMIDE | IBIDEN CO., LTD (JP) | 2010-02-25 | — | — | US | disclosed |
| EP-2128193-A1 | POROUS POLYIMIDE | Ibiden Co., Ltd. (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-20070149759-A1 | HYPERBRANCHED POLYIMIDE-BASED HYBRID MATERIAL | IBIDEN CO., LTD (50%) (JP) | 2007-06-28 | — | — | US | disclosed |
| US-6664021-B1 | Acid generator and silicon-containing polyimide ester precursor comprising partially esterified silicon-containing polyamic ester; radiating with light | CHISSO CORPORATION (JP) | 2003-12-16 | — | — | US | disclosed |
| EP-0601203-B1 | PHOTOSENSITIVE RESIN COMPOSITION | CHISSO CORP (JP) | 1999-09-29 | — | — | EP | disclosed |
| EP-0456469-A2 | Photosensitive heat-resistant polymer having hydroxyphenyl group | Chisso Corporation (JP) | 1991-11-13 | — | — | EP | disclosed |
| US-5055549-A | Using isoimide intermediate | CHISSO CORPORATION (JP) | 1991-10-08 | — | — | US | disclosed |
| US-5026788-A | Photosensitive polymer having thiol group | CHISSO CORPORATION (JP) | 1991-06-25 | — | — | US | disclosed |
| US-5025088-A | Photosensitive poly(amide)imide heat-resistant polymer | CHISSO CORPORATION (JP) | 1991-06-18 | — | — | US | disclosed |
| US-4963635-A | REACTING A FLUORINE-CONTAINING DIANHYDRIDE OR DIANHYDRIDE, A FLUORINE-CONTAINING DIAMINE OR A DEIAMINE AND AN AMINO-CONTAINING OXYSILANE COMPOUND | CHISSO CORPORATION (JP) | 1990-10-16 | — | — | US | disclosed |
| EP-0381506-A2 | Silicon polyimide precursor composition | Chisso Corporation (JP) | 1990-08-08 | — | — | EP | disclosed |
| EP-0379377-A2 | Process for preparing photosensitive heat-resistant polymer | Chisso Corporation (JP) | 1990-07-25 | — | — | EP | disclosed |
| EP-0348092-A2 | Photosensitive polymer having thiol groups | Chisso Corporation (JP) | 1989-12-27 | — | — | EP | disclosed |
| EP-0341028-A2 | Process for the preparation of photosensitive polymers | Chisso Corporation (JP) | 1989-11-08 | — | — | EP | disclosed |
| EP-0330456-A1 | Preparation of silicon-containing polyimide precursor and cured polyimides obtained therefrom | CHISSO CORPORATION (JP) | 1989-08-30 | — | — | EP | disclosed |