SCHEMBL244534

SCHEMBL244534

C=C(C)C(=O)OCC(F)(F)S(=O)(=O)O.CCN(CC)CC

nearest known ligand 0.37

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.37
TSHR P16473 3/20 0.36
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2624987 0.91 TSHR (0.41) THRBTSHRALDH1A1
SCHEMBL543947 0.89 TSHR (0.40) THRBTSHRALDH1A1
SCHEMBL15497018 0.80 TSHR (0.36) THRBTSHRALDH1A1
SCHEMBL2222135 0.80 TSHR (0.36) THRBTSHRALDH1A1
Thiophene SCHEMBL28212720 0.79 TSHR (0.33) THRBTSHRALDH1A1
SCHEMBL17829481 0.79 THRB (0.44) THRBTSHRALDH1A1
SCHEMBL1262421 0.78 CHRM2 (0.31)
SCHEMBL11964336 0.78 THRB (0.39) THRBTSHRALDH1A1
SCHEMBL247675 0.77 THRB (0.40) THRBTSHR
SCHEMBL17403610 0.77 ALDH1A1 (0.32) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12372867-B2 Photoresists comprising multiple acid generator compounds DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) 2025-07-29 US disclosed
US-10844037-B2 Aryl acetate onium materials ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2020-11-24 US disclosed
CN-105511228-B Photoresist compositions and related methods of forming electronic devices 罗门哈斯电子材料有限责任公司 2020-01-14 CN disclosed
CN-104614938-B Aryl onium acetate materials 罗门哈斯电子材料有限公司 2019-12-20 CN disclosed
US-10274825-B2 Acid generator compounds and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-04-30 US disclosed
US-10025181-B2 Polymer composition and photoresist comprising same DOW GLOBAL TECHNOLOGIES LLC (US) 2018-07-17 US disclosed
CN-103676477-B Give birth to acid immunomodulator compounds and include its photoresist 罗门哈斯电子材料有限公司 2018-05-08 CN disclosed
US-9606434-B2 Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2017-03-28 US disclosed
US-9557642-B2 Photoresist composition and associated method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-01-31 US disclosed
US-9551930-B2 Photoresist composition and associated method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-01-24 US disclosed
CN-103676478-A Photoresists comprising multiple acid generator compounds ROHM & HAAS ELECT MAT 2014-03-26 CN disclosed
US-20140080059-A1 ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2014-03-20 US disclosed
US-20140080060-A1 ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-03-20 US disclosed
US-20140080062-A1 PHOTORESISTS COMPRISING MULTIPLE ACID GENERATOR COMPOUNDS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2014-03-20 US disclosed
US-20140080058-A1 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2014-03-20 US disclosed
EP-2540750-A1 Polymer composition and photoresist comprising same Dow Global Technologies LLC (US) 2013-01-02 EP disclosed
US-20120328983-A1 POLYMER COMPOSITION AND PHOTORESIST COMPRISING SAME DOW GLOBAL TECHNOLOGIES LLC (US) 2012-12-27 US disclosed
US-20120171616-A1 POLYMERIZABLE PHOTOACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2012-07-05 US disclosed
EP-2472323-A2 Polymerizable photoacid generators Rohm and Haas Electronic Materials LLC (US) 2012-07-04 EP disclosed
US-20120004447-A1 Ammonium Fluoroalkanesulfonates and a Synthesis Method Therefor CENTRAL GLASS COMPANY, LIMITED (JP) 2012-01-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10844037-B2 Aryl acetate onium materials NAT1, AHR, AADAC THRB 2176/4885TSHR 2284/4885ALDH1A1 118/4885
US-20120171616-A1 POLYMERIZABLE PHOTOACID GENERATORS H1-0, H1-10, F10 THRB 3884/4885TSHR 1892/4885ALDH1A1 1378/4885
US-20120004447-A1 Ammonium Fluoroalkanesulfonates and a Synthesis Method Therefor NOTUM, FAR1, PFAS THRB 4247/4885TSHR 3858/4885ALDH1A1 1371/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.