SCHEMBL24526587

SCHEMBL24526587

CC(C)CC(C(=O)OCC1CC2CC1CC2C#N)C(C)C

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ DPP4 P27487 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19125903 0.87 DPP4 (0.33) DPP4
SCHEMBL18647978 0.79 — —
SCHEMBL23963257 0.71 TSHR (0.33) —
SCHEMBL25810854 0.65 ALDH1A1 (0.46) —
SCHEMBL13758098 0.64 — —
SCHEMBL24512614 0.63 — —
SCHEMBL23059482 0.63 — —
SCHEMBL17852291 0.63 SLC1A3 (0.35) —
SCHEMBL18560732 0.63 SLC1A3 (0.35) —
SCHEMBL16799549 0.63 SLC1A3 (0.35) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230229078-A1 CHEMICAL LIQUID SUPPLY METHOD AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2023-07-20 — — US disclosed
US-20220197137-A1 PRE-WET LIQUID, RESIST FILM FORMING METHOD, PATTERN FORMING METHOD, AND KIT FUJIFILM CORPORATION (JP) 2022-06-23 — — US disclosed
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