SCHEMBL23059482

SCHEMBL23059482

CC(C)C(=O)OC1CC2CC1CC2C#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13758098 0.88 — —
SCHEMBL10033541 0.85 HMGCR (0.31) —
SCHEMBL13823373 0.79 — —
SCHEMBL21505907 0.76 ALDH1A1 (0.31) —
SCHEMBL24687529 0.76 ALDH1A1 (0.31) —
SCHEMBL304110 0.76 ALDH1A1 (0.31) —
SCHEMBL10180043 0.74 ATM (0.30) —
SCHEMBL19038481 0.72 ATM (0.41) —
SCHEMBL23974099 0.72 — —
SCHEMBL21164018 0.72 DPP4 (0.30) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021039407-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2021-03-04 — — WO disclosed
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