SCHEMBL2452802

SCHEMBL2452802

CCO[Si](OCC)(OCC)c1ccc(OC)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.48
CA2 P00918 2/20 0.48
CA7 P43166 2/20 0.48
CA9 Q16790 2/20 0.48
CA12 O43570 1/20 0.48
CA14 Q9ULX7 1/20 0.48
NR1I2 O75469 1/20 0.42
ACHE P22303 1/20 0.41
ALDH1A1 P00352 2/20 0.40
IDO1 P14902 2/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
TDP1 Q9NUW8 3/20 0.39
MAPK1 P28482 2/20 0.39
GAA P10253 2/20 0.39
MAPT P10636 2/20 0.39
KDM4E B2RXH2 2/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
PDE4B Q07343 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6748661 0.91 HTT (0.40) CA1CA2CA7CA9CA12
SCHEMBL6748390 0.86 KDM4E (0.40) CA1CA2CA7CA9CA12
SCHEMBL50701 0.86 NQO1 (0.35)
SCHEMBL20478197 0.86 NQO1 (0.35)
SCHEMBL3482706 0.83 CA1 (0.44) CA1CA2CA7CA9CA12
SCHEMBL7621970 0.83 CA1 (0.48) CA1CA2CA7CA9CA12
SCHEMBL14226958 0.83 NQO1 (0.61) CA1CA2CA7CA9CA12
SCHEMBL544789 0.81 NQO1 (0.32)
SCHEMBL3482283 0.81 CA1 (0.46) CA1CA2CA7CA9CA12
SCHEMBL14226980 0.80 NQO1 (0.41) CA1CA2CA7CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 258 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120041122-A Epoxy resin underfill adhesive and preparation method thereof 深圳先进电子材料国际创新研究院 2025-05-27 CN claimed
CN-117815419-A Refrigerator deodorant containing nano metal powder and preparation method thereof 孔维上 2024-04-05 CN claimed
CN-116410454-B Surface-organized double metal cyanide catalyst, preparation method and application thereof 杭州合材科技有限公司 2024-03-22 CN claimed
CN-116410454-A Surface-organized double metal cyanide catalyst, preparation method and application thereof 杭州宏聚材科技有限公司 2023-07-11 CN claimed
WO-2021152539-A1 SURFACE-TREATED CROSSLINKED FUNCTIONAL LAYERS FOR OPTOELECTRONIC DEVICES KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY (SA) 2021-08-05 WO claimed
US-20210171557-A1 WRAPPING PEROVSKITE GRAINS WITH SILICA SHELLS FOR IMPROVED STABILITY AND EFFICIENCY OF PEROVSKITE ELECTRONIC DEVICES UNITED STATES DEPARTMENT OF ENERGY 2021-06-10 US claimed
US-10012065-B2 Hydrophobic surface treatment for use in subterranean formation operations HALLIBURTON ENERGY SERVICES, INC. (US) 2018-07-03 US claimed
US-20170190961-A1 Hydrophobic Surface Treatment For Use In Subterranean Formation Operations HALLIBURTON ENERGY SERVICES, INC. (US) 2017-07-06 US claimed
EP-2628744-B1 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process SHINETSU CHEMICAL CO (JP) 2016-11-30 EP claimed
WO-2016025004-A1 HYDROPHOBIC SURFACE TREATMENT FOR USE IN SUBTERRANEAN FORMATION OPERATIONS HALLIBURTON ENERGY SERVICES, INC. (US) 2016-02-18 WO claimed
EP-2628745-B1 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process SHINETSU CHEMICAL CO (JP) 2015-03-25 EP claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
EP-4590737-B1 COMPOSITION AND ARTICLE INCLUDING A THERMOPLASTIC AND A BRANCHED SILSESQUIOXANE POLYMER AND RELATED PROCESS 3M INNOVATIVE PROPERTIES COMPANY (US) 2026-04-29 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
WO-2008097616-A1 HYDROGEL-METAL ASSEMBLY THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY (US) 2008-08-14 WO disclosed
WO-2007128550-A1 BIOCOMPATIBLE THREE DIMENSIONAL MATRIX FOR THE IMMOBILIZATION OF BIOLOGICAL SUBSTANCES LEUKOCARE AG (DE) 2007-11-15 WO disclosed
EP-1852443-A1 Biocompatible three dimensional matrix for the immobilization of biological substances Leukocare AG (DE) 2007-11-07 EP disclosed
US-7291747-B2 Silicon compounds and process for preparation thereof CHISSO CORPORATION (JP) 2007-11-06 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260118767-A1 REVERSE PATTERNING PROCESS EFNA1, EPHA4, ETV6 CA1 1449/4885CA2 2902/4885CA7 1389/4885
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SMC1A, SPOUT1, LBR CA1 964/4885CA2 2105/4885CA7 2262/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.