Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 4/20 | 0.46 |
| ▸ | MAOB | P27338 | 5/20 | 0.46 |
| ▸ | NR4A2 | P43354 | 2/20 | 0.45 |
| ▸ | RXRA | P19793 | 1/20 | 0.45 |
| ▸ | RXRB | P28702 | 1/20 | 0.45 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.44 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.44 |
| ▸ | PTPN2 | P17706 | 2/20 | 0.40 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.40 |
| ▸ | PTPRB | P23467 | 2/20 | 0.40 |
| ▸ | PTPN6 | P29350 | 2/20 | 0.40 |
| ▸ | PTPN11 | Q06124 | 2/20 | 0.40 |
| ▸ | PTPRC | P08575 | 1/20 | 0.40 |
| ▸ | CDC25A | P30304 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | PPARG | P37231 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18811515 | 0.93 | RXRA (0.47) | APPMAOBNR4A2RXRARXRB | |
| SCHEMBL5164170 | 0.91 | MEN1 (0.51) | MAOBNR4A2NR4A1NR4A3MEN1 | |
| SCHEMBL24533738 | 0.90 | MAOB (0.38) | APPMAOBNR4A2RXRARXRB | |
| SCHEMBL24533723 | 0.82 | APP (0.61) | APPMAOBNR4A2RXRARXRB | |
| SCHEMBL26575146 | 0.79 | RXRA (0.35) | MAOBRXRARXRBPTPN1PTPRC | |
| SCHEMBL9270383 | 0.78 | NQO1 (0.42) | RXRARXRB | |
| SCHEMBL9434943 | 0.78 | MAOB (0.58) | MAOBNR4A2NR4A1NR4A3 | |
| SCHEMBL9342676 | 0.77 | TUBB1 (0.61) | APPMAOBNR4A2RXRARXRB | |
| SCHEMBL24533757 | 0.77 | APP (0.50) | APPMAOBNR4A2RXRARXRB | |
| SCHEMBL24533749 | 0.76 | HRH3 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170121437-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK | FUJIFILM CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| US-20170121437-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK | FUJIFILM CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |